Method of providing close contact for contact printing
Orientation of ordered liquids and their use in devices Patent #: 4256787
ApplicationNo. 06/419644 filed on 09/17/1982
US Classes:430/5, Radiation mask156/107, Sandwich edge sealing156/145, With encapsulating of permanently fluent material in hollow or porous lamina or filling of space between adhered laminae156/99, Optically transparent glass sandwich making (e.g., window or filter)427/164, Transparent base427/165, Glass427/287, Metal, glass, or ceramic base428/203, Translucent outer layer428/209, Including metal layer428/210, Including ceramic, glass, porcelain or quartz layer430/396EFFECTING FRONTAL RADIATION MODIFICATION DURING EXPOSURE, E,G., SCREENING, MASKING, STENCILING, ETC.
ExaminersPrimary: Hess, Bruce H.
Attorney, Agent or Firm
International ClassG03F 1/14 (20060101)
AbstractA photomask (30) used to form patterns on a resist coated semiconductor wafer is comprised of a transparent baseplate (31) having a thin metallic pattern (32) thereon; a transparent, planar coverplate (33) in intimate contact with the patterned baseplate (31) and an index matching fluid (34) interposed therebetween.
Field of SearchWORK SURFACE SHIELDS, MASKS OR PROTECTORS