Methods of fabricating a photomask
Patent 4405701 Issued on September 20, 1983. Estimated Expiration Date: 
September 17, 2002. Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.
September 17, 2002. Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.Patent References 1985074 2175343 2317550 3193840 3400995 3906133 Method of providing close contact for contact printing Orientation of ordered liquids and their use in devices Patent #: 4256787 InventorsAssigneeApplicationNo. 06/419644 filed on 09/17/1982US Classes:430/5, Radiation mask156/107, Sandwich edge sealing156/145, With encapsulating of permanently fluent material in hollow or porous lamina or filling of space between adhered laminae156/99, Optically transparent glass sandwich making (e.g., window or filter)427/164, Transparent base427/165, Glass427/287, Metal, glass, or ceramic base428/203, Translucent outer layer428/209, Including metal layer428/210, Including ceramic, glass, porcelain or quartz layer430/396EFFECTING FRONTAL RADIATION MODIFICATION DURING EXPOSURE, E,G., SCREENING, MASKING, STENCILING, ETC.ExaminersPrimary: Hess, Bruce H.Attorney, Agent or FirmInternational ClassG03F 1/14 (20060101)AbstractA photomask (30) used to form patterns on a resist coated semiconductor wafer is comprised of a transparent baseplate (31) having a thin metallic pattern (32) thereon; a transparent, planar coverplate (33) in intimate contact with the patterned baseplate (31) and an index matching fluid (34) interposed therebetween.Field of SearchWORK SURFACE SHIELDS, MASKS OR PROTECTORS |
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