U.S. patents available from 1976 to present.
U.S. patent applications available from 2005 to present.

Positive developer containing non-ionic surfactants

Patent 4374920 Issued on February 22, 1983. Estimated Expiration Date: Icon_subject July 27, 2001. Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.

Patent References

3110596

3586504

3669660

3707373

3738850

3745028

3868254

3891438

3891439

Substractive developer for negative working lithographic plates
Patent #: 3954472
Issued on: 05/04/1976
Inventor: Walls

More ...

Inventors

Assignee

Application

No. 06/287465 filed on 07/27/1981

US Classes:

430/331, Finishing or perfecting composition or product430/309Post imaging process

Examiners

Primary: Smith, John D.

Attorney, Agent or Firm

International Class

G03F 7/32 (20060101)

Abstract

A developer composition for positive working lithographic printing plates and photoresists comprising an aqueous alkaline solution with a non-ionic surfactant.

Other References

  • Schick, "Non-Ionic Surfactants," Marcel Dekker, Inc., N.Y., c 1967, pp. 413-414
  • Chemical Abstracts, 186365q Presensitized Photolithographic Printing Plates, Wade, John E., vol. 83, 1975, p. 491
  • Chemical Abstracts, 99071j Liquid Developers for Lithographic Photosensitive Plates Containing Diazo Compound, Matsumoto, Hiroshi, vol. 86, 1977, p. 649
  • Chemical Abstracts, 44133x Developers for Diazo-Sensitized Lithographic Plates, Rowe, William, vol. 81, 1974
  • Chemical Abstracts, 170917k Developer for Photosensitive Lithographic Plates Containing o-Quinonediazide Compounds, Watanabe, Masaru, vol. 83, 1975, p. 458
PatentsPlus Images
Enhanced PDF formats
loading...
PatentsPlus: add to cart
PatentsPlus: add to cartSearch-enhanced full patent PDF image
$9.95more info
 
Sign InRegister
Username  
Password   
forgot password?