Method of producing a microstructured surface and the article produced thereby
Patent 4340276 Issued on July 20, 1982. Estimated Expiration Date: 
October 10, 1999. Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.
October 10, 1999. Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.Patent References 2432434 2628921 3490982 3842306 3871881 Method of making duplicates of optical or sound recordings Coated aluminum substrates Photon energy converter Reducing the reflectance of surfaces to radiation Method for providing porous broad-band antireflective surface layers on chemically-durable borosilicate glasses InventorsAssigneeApplicationNo. 06/080530 filed on 10/10/1979US Classes:359/581, By transmissive coating on lens204/192.27, Reflective204/192.3, With sputter etching204/192.32, Sputter etching427/164, Transparent base428/148, Metal or metal compound428/333, In terms of molecular thickness or light wave length428/338, Monolayer with structurally defined element428/339, Including synthetic resin or polymer layer or component428/412, Of polycarbonate428/458Next to polyester, polyamide or polyimide (e.g., alkyd, glue, or nylon, etc.)ExaminersPrimary: Gantz, Delbert E.Assistant: Leader, William T. Attorney, Agent or FirmInternational ClassesB29D 11/00 (20060101)C08J 7/00 (20060101) C08J 7/12 (20060101) AbstractA method is disclosed for producing a micro structure on the surface of an article. The method comprises the steps of depositing a discontinuous coating of a material exhibiting a low rate of sputter etching on a substrate exhibiting a higher rate of sputter etching and differentially sputter etching the composite surface to produce a topography of pyramid-like micropedestals random in height and separation. The articles produced by this method are characterized by both the microstructured surface and by the detectable presence of the material exhibiting the lower rate of sputter etching. The microstructured surface results in the articles having uniform antireflecting properties over a large range of angles of incident light and over an extremely broad range of wavelengths, in which the antireflecting characteristic is obtained without an attendant increase in diffuse scattering. Also, the microstructured surface results in the articles being characterized by a high degree of adherence, such that the treated surface may be considered to be "primed", thereby enabling the application of highly adherent coatings or layers thereon.Other References
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