U.S. patents available from 1976 to present.
U.S. patent applications available from 2005 to present.

Semiconductor laser device

Patent 4315226 Issued on February 9, 1982. Estimated Expiration Date: Icon_subject September 20, 1999. Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.

Inventors

Assignee

Application

No. 06/077735 filed on 09/20/1979

US Classes:

372/45.01Particular confinement layer

Examiners

Primary: Davie, James W.

Attorney, Agent or Firm

International Classes

H01S 5/00 (20060101)
H01S 5/20 (20060101)
H01S 5/32 (20060101)
H01S 5/227 (20060101)

Foreign Application Priority Data

1978-09-20 JP

Abstract

A semiconductor laser device is capable of producing an increased optical output power with improved optical characteristics without being subjected to mode distortions in the output beam, while retaining advantageous features inherent to a semiconductor laser device of a buried heterostructure. The semiconductor laser device comprises an optical confinement region which is constituted by at least first, second, third and fourth semiconductor layers successively laminated on a predetemined semiconductor substrate. The second semiconductor layer has a relatively small refractive index and a relatively wide band gap as compared with those of the third semiconductor layer, while the first and the fourth semiconductor layers which are of the conductivity types opposite to each other have relatively small refractive indexes as compared with the second and the third semiconductor layers. The band gaps of the fourth and the second semiconductor layers are relatively large as compared with that of the third semiconductor layer. Difference in the band gap at least between the second and the third semiconductor layers is not smaller than 0.15 eV.

Other References

  • Kressel et al., "Low-Threshold LOC GaAs Injection Lasers", Applied Physics Letters, vol. 18, No. 2, Jan. 15, 1971, pp. 43-45
  • Tsukada, "GaAs-Ga1-x Alx As Buried-Heterostructure Injection Lasers", Journal of Applied Physics, vol. 45, No. 11, Nov. 1974, pp. 4899-4906
  • Pawlik et Doppel-"Doppal-Hetero-Strukturkaser fur Optische Nachrichtenubertragung", Siemens Forsch.-u. Entwickl.-Ber. Bd. 2(1973), pp. 210-217
  • Thompson et al., "(GaAl)As Lasers With a Heterostructure for Optical Confinement and Additional Heterojunctions for Extreme Carrier Confinement", IEEE Journal of Quantum Electronics, vol. QE-9, No. 2, Feb. 1973, pp. 311-318
  • Casey et al., "GaAs-Alx Ga1-x As Heterostructure Laser with Separate Optical and Carrier Confinement", J. Appl. Phys., vol. 45, No. 1, Jan. 1974, pp. 322-333
  • Cho et al., "Continuous Room-Temperature Operation of GaAs-Alx Ga1-x As Double-Heterostructure Lasers . . . ", App. Phys. Lett., vol. 28, No. 9, 1 May 1976, pp. 501-503
  • Thompson et al., "Narrow-Beam Five-Layer (GaAl)As/GaAs Heterostructure Lasers . . . ", J. of Appl. Phys., vol. 47, No. 4, Apr. 1976, pp. 1501-1514
  • Kajimura et al., "Leaky-Mode Buried-Heterostructure AlGaAs Injection Lasers", App. Phys. Lett., vol. 30, No. 11, June 1977, pp. 590-591
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