Phenol-free and chlorinated hydrocarbon-free photoresist stripper comprising surfactant and hydrotropic aromatic sulfonic acids
Organic stripping compositions and method for using same Patent #: 4165295
ApplicationNo. 06/187465 filed on 09/15/1980
US Classes:510/176, For stripping photoresist material134/3, Including acidic agent134/38, Paints, varnishes, lacquers, or enamels, removal134/42, Miscellaneous216/47, Mask is multilayer resist216/48, Mask is exposed to nonimaging radiation430/315, Material deposition only430/329, Removal of imaged layers430/331, Finishing or perfecting composition or product510/414, Sulfur containing anionically substituted surfactant510/493Sulfoxy (e.g., dimethyl sulfoxide, sulfone, etc.)
ExaminersPrimary: Albrecht, Dennis L.
Attorney, Agent or Firm
International ClassesC09D 9/00 (20060101)
G03F 7/42 (20060101)
C09D 9/04 (20060101)
AbstractA novel stripping composition and method of using same is disclosed, which stripping composition comprises:(a) a solvent comprising one or more compounds of formula (I) ##STR1## wherein R and R' are each selected independently from straight and branched alkyl having 1 to 3 carbon atoms, and phenyl, each of which phenyl is optionally substituted with one or more hydroxyl, or R and R' together are alkylene of 3 to 6 carbon atoms; and(b) a suitable organosulfonic acid.The stripping composition is especially useful for stripping positive photoresists faster and at lower temperatures than known strippers. A preferred composition comprises 10% by weight para-toluenesulfonic acid in dimethyl sulfoxide.