Patent ReferencesInventorAssigneeApplicationNo. 06/079747 filed on 09/28/1979US Classes:356/316, By high frequency field (e.g., plasma discharge)250/205, Controlling light source intensity315/151, Load device irradiating the radiant energy responsive device315/158Radiant energy controlled regulation of the current supply for the load deviceExaminersPrimary: Evans, F. L.International ClassesG01N 21/68 (20060101)G01N 21/62 (20060101) AbstractLong-term stability for an emission type plasma spectrometer is provided by automatically adjusting the output of a power supply which is being utilized to create the plasma. The automatic adjustment is based on a feedback signal which is derived by monitoring an atomic line of a carrier gas.Other References
Field of SearchBy high frequency field (e.g., plasma discharge) | |