U.S. patents available from 1976 to present.
U.S. patent applications available from 2005 to present.

Bonded cathode and electrode structure with layered insulation, and method of manufacture

Patent 4250428 Issued on February 10, 1981. Estimated Expiration Date: Icon_subject May 9, 1999. Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.

Patent References

3373307

3402314

3599031

3648096

Grid controlled electron source and method of making same
Patent #: 3967150
Issued on: 06/29/1976
Inventor: Lien ,   et al.

Lanthanated thermionic cathodes
Patent #: 4083811
Issued on: 04/11/1978
Inventor: Bachmann, et al.

Thermionic electron source with bonded control grid
Patent #: 4096406
Issued on: 06/20/1978
Inventor: Miram ,   et al.

Electron tube with dispenser cathode Patent #: 4165473
Issued on: 08/21/1979
Inventor: Falce

Inventors

Assignee

Application

No. 06/037257 filed on 05/09/1979

US Classes:

313/268, Insulating spacer between discharge electrodes313/107, Nonemissive material313/250, With spacer between electrodes or electrode supports313/348, Foraminous electrodes (e.g., grids) or shields445/58With coating, e.g., providing protective coating on sensitive area

Examiners

Primary: Chatmon, Saxfield Jr.

Attorney, Agent or Firm

International Classes

H01J 19/00 (20060101)
H01J 19/42 (20060101)

Abstract

The variety of technologies that have been applied in the development of a onded grid cathode are described. These include chemical vapor deposition of tungsten, molybdenum, iridium, BM, and Si3 N4 on both sides of a sintered tungsten cathode disk. Zirconium and titanium getters have been used to eliminate nitrogen evolution problems. Films of Si3 N4 have been added to the insulation to prevent calcium and barium diffusion into the layer and maintain adequate resistivity and breakdown strength. Plasma etching was introduced as a method of removing Si3 N4 from the cathode pores.

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