Interferogram synthesization method and apparatus

Patent 4238827 Issued on December 9, 1980. Estimated Expiration Date:

November 20, 1998. Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.

Abstract Claims Description Full Text

Patent References

1565533

3537096

3544833

3649754

3879988

Method for demonstrating optical aberration formation
Patent #: 3932949
Issued on: 01/20/1976
Inventor: King

Graphic display device
Patent #: 3988728
Issued on: 10/26/1976
Inventor: Inoue , et al.

Video display system Patent #: 4075620
Issued on: 02/21/1978
Inventor: Passavant , et al.

Inventors

Assignee

The United States of America as represented by the Secretary of the Army

Application

No. 05/962411 filed on 11/20/1978

US Classes:

345/20, Data responsive intensity control348/135, Object or scene measurement348/180, MONITORING, TESTING, OR MEASURING356/450, BY LIGHT INTERFERENCE (E.G., INTERFEROMETER)356/510, Tilt356/511Contour or profile

Examiners

Primary: Krass, Errol A.

Attorney, Agent or Firm

International Class

G01M 11/00 (20060101)

Abstract

Real time presentation and evaluation of any selected interferogram is realized by electronically simulating optical aberration patterns and displaying them on a cathode ray tube (CRT). The optical aberration patterns include PISTON; X and Y TILT; DEFOCUS; SPHERICAL; COMA; and ASTIGMATISM. The aberration patterns are generated electronically in response to the CRT beam sweep drive signal and are displayed as a function of CRT beam intensity. Any combination of aberration patterns, each having selectable coefficients, can be displayed. The aberration pattern coefficient values are indicated by a digital readout. Evaluation of an unknown interferogram is accomplished by varying aberration pattern combinations and coefficients until a substantial match with the unknown interferogram is achieved. The contributing aberration patterns are then known and their magnitudes are determined from the digital read-out.