U.S. patents available from 1976 to present.
U.S. patent applications available from 2005 to present.

Electrically reprogrammable non volatile memory

Patent 4228527 Issued on October 14, 1980. Estimated Expiration Date: Icon_subject February 22, 1999. Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.

Inventors

Application

No. 06/014251 filed on 02/22/1979

US Classes:

365/185.08, With volatile signal storage device257/316, With additional contacted control electrode257/369, Complementary insulated gate field effect transistors257/E27.062, Complementary MIS (EPO)257/E27.103, Electrically programmable ROM (EPO)365/181, Complementary conductivity365/185.1, Extended floating gate365/185.27, Substrate bias365/185.29, Erase365/185.32, Radiation erasure365/218Erase

Examiners

Primary: Hecker, Stuart N.

Attorney, Agent or Firm

International Classes

G11C 16/04 (20060101)
H01L 27/092 (20060101)
H01L 27/115 (20060101)
H01L 27/085 (20060101)

Foreign Application Priority Data

1978-02-22 CH

Abstract

An electrically reprogrammable non-volatile memory device is disclosed which includes complementary MOS transistors provided with a polycrystalline silicon floating gate electrode in a common n- -type substrate. The device comprises three main parts. The first part, which is used for writing, comprises a p-channel writing transistor, a p-channel control transistor and a resistance element. The second part, which comprises a second gate electrode capacitance coupled with the floating gate, is used for erasing. The third part is used for performing information read-out and consists of a p-channel transistor the gate of which forms a portion of the floating gate and the drain of which is connected to a read-out terminal and to the terminal of a loading element having its other terminal connected to a negative supply potential. This device enables writing control to be performed using a logical signal of the order of one volt, read-out being also performed with a low voltage value, with low energy consumption. Erasure of information can be performed electrically and the retention time is of several years.

Other References

  • Gosney, DIFMOS-A Floating-Gate Electrically Erasable Nonvolatile Semiconductor Memory Technology, IEEE Trans. on Electron Devices, vol. ED-24, No. 5, 5/77, pp. 594-599
  • Rossler et al., Erasable and Electrically Reprogrammable Read-Only Memory Using the N-Channel SIMOS One-Transistor Cell, Siemens Forschungsund Entwicklungsberichten, vol. 4, No. 6, 1975, pp. 345-362
  • Tarvi et al., Electrically Reprogrammable Nonvolatile Semiconductor Memory, IEEE Jour. of Solid-State Circuits, vol. SC-7, No. 5, 10/72, pp. 369-375
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