U.S. patents available from 1976 to present.
U.S. patent applications available from 2005 to present.

Apparatus for practicing temperature gradient zone melting

Patent 4224504 Issued on September 23, 1980. Estimated Expiration Date: Icon_subject June 21, 1998. Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.

Patent References

2881929

3209923

3476632

3666907

3891205

Apparatus for handling workpieces such as semiconductor substrates
Patent #: 4002246
Issued on: 01/11/1977
Inventor: Brandt ,   et al.

Furnace for practising temperature gradient zone melting Patent #: 4097226
Issued on: 06/27/1978
Inventor: Erikson ,   et al.

Inventors

Application

No. 05/917492 filed on 06/21/1978

US Classes:

219/388, With means whereby material to be heated may be passed continuously through heated area (e.g., conveyor)219/405, Including heat energy reflecting or directing means219/411, With infrared generating means392/411, Lamp banks (i.e., array of plural lamps)432/120, WORK CHAMBER HAVING HEATING MEANS432/231Article engaging and retaining support fixes position of article relative to heat emitter

Examiners

Primary: Goldberg, Elliot A.
Assistant: Roskoski, Bernard

Attorney, Agent or Firm

International Classes

C30B 13/02 (20060101)
C30B 13/00 (20060101)
H01L 21/00 (20060101)

Abstract

An apparatus for practicing temperature gradient zone melting simultaneously on a plurality of semiconductor bodies comprises a closable work chamber for receiving the bodies for processing; a heat source disposed in the work chamber and comprising a first closure member thereof; a heat sink disposed in the work chamber and comprising a second closure member thereof and means for transferring one or more bodies of semiconductor material to the work chamber for processing and from the work chamber subsequent to processing. The transferring means comprises manipulative means for selectively engaging the semiconductor bodies and supporting the bodies in transit and drive means for moving the manipulative means toward and away from the work chamber and orienting the manipulative means with respect to the semiconductor bodies.

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