System for etching patterns of small openings on a continuous strip of metal

Patent 4124437 Issued on November 7, 1978. Estimated Expiration Date:

April 5, 1996. Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.

Abstract Claims Description Full Text

Patent References

2536383

3082774

3385745

3415699

3679500

3929551

Etching process for accurately making small holes in thick materials Patent #: 3971682
Issued on: 07/27/1976
Inventor: Frantzen , et al.

Inventors

Application

No. 05/673598 filed on 04/05/1976

US Classes:

216/92, Projecting etchant against a moving substrate or controlling the angle or pattern projection of the etchant or controlling the angle or pattern of movement of the substrate156/345.19, With mechanical mask or shield or shutter for shielding workpiece156/345.2, Running length workpiece (e.g., etching indeterminate length strip)156/345.21, Liquid etchant spray type156/345.22, With plural etching zones for a single discrete workpiece in apparatus216/12, FORMING OR TREATING MASK USED FOR ITS NONETCHING FUNCTION (E.G., SHADOW MASK, X-RAY MASK, ETC.)216/41, MASKING OF A SUBSTRATE USING MATERIAL RESISTANT TO AN ETCHANT (I.E., ETCH RESIST)445/47Multi-apertured panel making, e.g., CRT mask

Examiners

Primary: Powell, William A.

Attorney, Agent or Firm

Jacobson and Johnson

International Classes

C23F 1/08 (20060101)
H01J 9/14 (20060101)

Abstract

An etching system having a first member for unrolling and fastening a protective film on one side of a continuous strip of metal and a second member for smoothly stripping the protective film from the continuous strip of metal after the continuous strip of metal and the protective film have passed between sets of spray jets that are located on opposite sides of the continuous strip of metal. Further etching and rinsing stations are provided for completing the etching process to enable mass production of television aperture masks having a plurality of openings which have a dimension on the order of or less than the thickness of the mask material.