Thin film strain gauge and method of fabrication
Patent 4104605 Issued on August 1, 1978. Estimated Expiration Date: 
September 15, 1996. Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.
September 15, 1996. Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.Patent References 2590566 3197335 3805377 3828606 InventorsApplicationNo. 05/723566 filed on 09/15/1976US Classes:338/2, STRAIN GAUGE TYPE204/192.1, Coating, forming or etching by sputtering338/5, Dynamometer type427/124, Vapor deposition or utilizing vacuum427/96.8Vapor or gas depositionExaminersPrimary: Lovering, Richard D.Attorney, Agent or FirmInternational ClassesG01L 1/20 (20060101)G01L 1/22 (20060101) G01B 7/16 (20060101) AbstractA thin film strain gauge fabricated by depositing a first film of a high temperature insulating material upon a surface of an article to be tested, depositing both a thin film of a resistive material and a conducting lead in connection with each end of the resistive pattern upon the surface of the first film and overcoating the resistive strain gauge film and at least a portion of the conducting leads with a second film of high temperature insulating material to protect the strain gauge against corrosion and erosion in its operating environment. |
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