Vapor desposition method
Patent 4061800 Issued on December 6, 1977. Estimated Expiration Date: 
December 6, 1994. Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.
December 6, 1994. Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.Patent References 2440135 2584660 2910039 3281517 3446936 3574650 3690933 Feed search system for optical disk recording device Patent #: 5598384 InventorApplicationNo. 05/652774 filed on 01/27/1976US Classes:427/568, Silicon containing coating supply or source118/726, Crucible or evaporator structure392/387, Method392/389, With crucible427/591Induction or dielectric heatingExaminersPrimary: Newsome, John H.Attorney, Agent or FirmInternational ClassC23C 14/24 (20060101)AbstractMethod and apparatus for effecting vapor deposition of a material on an object. The material is vaporized in a closed chamber, and the pressure is allowed to build up in the chamber as the material vaporizes. Thereafter, the chamber is opened, and the vapor is applied to the object in a super-heated, high pressure state. If desired, additional materials can be injected into the chamber and added to the vapor before the chamber is opened. | |
