Apparatus for cleaning slices of material
Patent 4024596 Issued on May 24, 1977. Estimated Expiration Date: 
May 24, 1994. Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.
May 24, 1994. Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.Patent References 1261688 2311481 2980935 3150401 3473181 3585668 3748677 Methods and apparatus for treating wafer-like articles Patent #: 3970471 AbstractBoth sides of thin slices of material are cleaned simultaneously in the apparatus of this invention. A slice of material rotates about its axis as it passes between opposed rotatable cleaning surfaces. The apparatus includes a stop which maintains the slice of material off-center with respect to the cleaning surfaces. The apparatus is particularly useful for cleaning slices of semiconductor material.Field of SearchSheet, bar, and plate cleaners | |
