Thermally developable photosensitive material
Patent 4021250 Issued on May 3, 1977. Estimated Expiration Date: 
May 3, 1994. Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.
May 3, 1994. Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.Patent References 2981738 3413138 3531286 3764328 InventorsAssigneeApplicationNo. 05/510970 filed on 10/01/1974US Classes:430/619And inorganic silver compoundExaminersPrimary: Kimlin, Edward C.Assistant: Falasco, L. Attorney, Agent or FirmInternational ClassG03C 1/498 (20060101)Foreign Application Priority Data1973-10-01 JAAbstractA thermally developable photosensitive material comprising a support having thereon in one or more layers, (a) an organic silver salt, (b) a catalytic amount of a photosensitive silver halide or a compound capable of forming photosensitive silver halide, (c) a reducing agent, (d) a binder and (e) at least one compound represented by the following general formula (I), ##STR1## wherein R1 and R2 each is an alkyl group or an aralkyl group; and R3 is a hydrogen atom, an alkyl group, a chloroanilino group, a benzyloxy group, a 2-oxo-1-(N-phenylcarbamoyl)propyl group or a substituted phenyl group having one or more of a chlorine atom, an alkyl group, an amino group, an alkylamino group and a dialkylamino group as substituents; the following general formula (II), ##STR2## wherein R4 is a ##STR3## group, a ##STR4## group or a --NH(CH2)n --NH-- group; and n is an integer of 1 to 5; or the following general formula (III), ##STR5## wherein R5 is an aryl group, a 3-pyridyl group or a 2-thienyl group, and X is --S--, --O-- or --NH--. |
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