Method of making resistive films
Patent 4016061 Issued on April 5, 1977. Estimated Expiration Date: 
April 5, 1994. Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.
April 5, 1994. Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.Patent References 3395089 3664931 3736242 InventorsAssigneeApplicationNo. 05/433892 filed on 01/16/1974US Classes:204/192.21, Resistor204/192.1, Coating, forming or etching by sputtering204/192.15, Specified deposition material or use338/315WITH MOUNTING OR SUPPORTING MEANSExaminersPrimary: Vertiz, O. R.Assistant: Langel, Wayne A. Attorney, Agent or FirmForeign Application Priority Data1971-03-17 JAAbstractA resistive film composition consisting essentially of AlN and solid solution of TiN and ZrN and a method of making the same by means of cathodic sputtering. |
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