Inventor: Yukihiro Tominaga

Address: Tokyo, JP
No. of patents: 2
Last patent issue date: 05/22/2001

Number	Title	Issue Date
6234214	Method for handling semiconductor wafers in a clean room by wearing dust proof clothing Dust proof clothing is made of a given fabric structure defined by multiple first fiber groups which are each composed of linear fibers and extend in a first direction, and multiple second fiber groups which are each composed of curved fibers and extend i...	05/22/2001
6034007	Material construction for dust proof clothing for clean rooms The object of the present invention is to provide dust proof clothing comprised such that on the inside of the dust proof clothing in contact with the wearer a lot of dust is caught, and on the outside of the dust proof clothing dust does not attach easil...	03/07/2000

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