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...that Kleenex tissue was originally designed to be a gas mask filter? It was developed at the beginning of World War I to replace cotton, which was then in short supply as a surgical dressing.
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| Number | Title | Issue Date |
| 7977258 | Method and system for thermally processing a plurality of wafer-shaped objects Process and system for processing wafer-shaped objects, such as semiconductor wafers is disclosed. In accordance with the present disclosure, a multiple of two wafers are processed in a thermal processing chamber. The thermal processing chamber is in communication w... | 07/12/2011 |
| 7737385 | Selective reflectivity process chamber with customized wavelength response and method A customizable chamber spectral response is described which can be used at least to tailor chamber performance for wafer heating, wafer cooling, temperature measurement, and stray light. In one aspect, a system is described for processing a treatment object having a... | 06/15/2010 |
| 7151060 | Device and method for thermally treating semiconductor wafers A device for thermally treating semiconductor wafers having at least one silicon layer to be oxidized and a metal layer, preferably a tungsten layer, which is not to be oxidized. The inventive device comprises the following: at least one radiation source; a treatmen... | 12/19/2006 |
| 7115837 | Selective reflectivity process chamber with customized wavelength response and method A customizable chamber spectral response is described which can be used at least to tailor chamber performance for wafer heating, wafer cooling, temperature measurement, and stray light. In one aspect, a system is described for processing a treatment object having a... | 10/03/2006 |
| 6707011 | Rapid thermal processing system for integrated circuits In a rapid thermal processing system an array of heat lamps generate radiant heat for heating the surfaces of a semiconductor substrate, such as a semiconductor wafer, to a selected temperature or set of temperatures while held within an enclosed chamber. The heat l... | 03/16/2004 |
| 6706643 | UV-enhanced oxy-nitridation of semiconductor substrates The oxynitride or oxide layer is formed on a semiconductor substrate by subjecting the substrate to UV radiation while exposed to a gaseous atmosphere of O2 and one or more of N2, N2O, H2 and NH3. Thereafter, a ... | 03/16/2004 |
| 6600138 | Rapid thermal processing system for integrated circuits In a rapid thermal processing system an array of heat lamps generate radiant heat for heating the surfaces of a semiconductor substrate, such as a semiconductor wafer, to a selected temperature or set of temperatures while held within an enclosed chamber.... | 07/29/2003 |
| 6451713 | UV pretreatment process for ultra-thin oxynitride formation The oxynitride or oxide layer formed on a semiconductor substrate is pre-treated with UV-excited gas (such as chlorine or nitrogen) to improve the layer surface condition and increase the density of nucleation sites for subsequent silicon nitride depositi... | 09/17/2002 |
| 6403923 | System for controlling the temperature of a reflective substrate during rapid heating A system and process is disclosed for rapidly heating semiconductor wafers coated with a highly reflective material on either the whole wafer or in a patterned area. The wafers are heated in a thermal processing chamber by a plurality of lamps. In order f... | 06/11/2002 |
| 6359263 | System for controlling the temperature of a reflective substrate during rapid heating A system and process is disclosed for rapidly heating semiconductor wafers coated with a highly reflective material on either the whole wafer or in a patterned area. The wafers are heated in a thermal processing chamber by a plurality of lamps. In order f... | 03/19/2002 |
| 6204484 | System for measuring the temperature of a semiconductor wafer during thermal processing An apparatus for heat treating semiconductor wafers is disclosed. In accordance with the present invention, the apparatus includes a temperature measuring system for determining the temperature of semiconductor wafers being heated within the apparatus. Th... | 03/20/2001 |
| 6200023 | Method for determining the temperature in a thermal processing chamber A system and method for determining the temperature of substrates in a thermal processing chamber in the presence of either an oxidizing atmosphere or a reducing atmosphere is disclosed. Specifically, temperature determinations made in accordance with the... | 03/13/2001 |
| 6075922 | Process for preventing gas leaks in an atmospheric thermal processing chamber A process and system for preventing gases from either leaking into or out of a thermal processing chamber that is designed to operate at or near atmospheric pressure is disclosed. For instance, in one embodiment, gases are prevented from leaking into a th... | 06/13/2000 |
