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Inventor: Tomoyuki Sasaki


Address: Uji, JP
No. of patents: 1
Last patent issue date: 02/13/2001

NumberTitleIssue Date
6187688Pattern formation method
After an organic bottom anti-reflective coating (12) is deposited on an underlying film (11), a resist pattern (15) is formed on the organic bottom anti-reflective coating (12). Dry etching is performed with respect to the organic bottom anti-reflective c...
02/13/2001
 
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