|6911285||Sidelobe correction for attenuated phase shift masks|
A method and system for simply and efficiently correcting sidelobe formation is disclosed. The method for reducing sidelobe formation in an aerial image created from an attenuated phase shift mask used in photolithography includes the steps of: a) generating a densi...
|6854104||First approximation for OPC significant speed-up|
An optical proximity correction system for local correction of an aerial image produced from a mask having transmissive portions and blocking portions collectively defining a target design includes an analyzer to match one or more segments of the target design to on...