Did You Know...
...that Kleenex tissue was originally designed to be a gas mask filter? It was developed at the beginning of World War I to replace cotton, which was then in short supply as a surgical dressing.
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| Number | Title | Issue Date |
| 7738076 | Exposure apparatus and device manufacturing method An exposure apparatus for exposing a substrate to exposure light via a pattern of a mask. The apparatus includes a stage configured to hold one of the substrate and the mask, and to move, a projection optical system configured to project the pattern onto the substra... | 06/15/2010 |
| 7123343 | Exposure apparatus and device manufacturing method An exposure apparatus which projects and transfers a pattern formed on a mask to a substrate using exposure light includes a stage, an optical system, and a gas stream forming mechanism which forms a stream of inert gas in an optical path space including a space whi... | 10/17/2006 |
| 7050152 | Exposure apparatus An exposure apparatus for exposing an object put on a first stage by irradiating light from a light source onto the object through an exposure optical system includes a partition for isolating a first space where the first stage is arranged and isolating a second sp... | 05/23/2006 |
| 7027131 | Exposure apparatus An exposure apparatus includes an optical system for guiding light from a light source to an object, a holding member for holding the object, and a measuring device for measuring position of the holding member by using a reference surface provided in the holding mem... | 04/11/2006 |
| 6954255 | Exposure apparatus An exposure apparatus which projects a pattern formed on a mask onto a substrate by using exposure light. The apparatus includes a shielding member which surrounds a light path space through which exposure light passes and has a passage which makes the light path sp... | 10/11/2005 |
| 6934003 | Exposure apparatus and device manufacturing method An exposure apparatus which projects and transfers a pattern formed on a mask to a substrate using exposure light includes a stage, an optical system, and a gas stream forming mechanism which forms a stream of inert gas in an optical path space including a space whi... | 08/23/2005 |
| 6750946 | Processing apparatus for processing sample in predetermined atmosphere A substrate processing system has a first processing device which processes a substrate with a first process in a first gas atmosphere within a process chamber and a transfer device that transfers a substrate in a second gas atmosphere within a clean booth, the tran... | 06/15/2004 |
| 6721032 | Exposure apparatus and control method therefor, and device manufacturing method An exposure apparatus includes an illumination optical system which illuminates a pattern formed on a mask with light from a light source, a movable mask stage for holding the mask, a projection optical system which guides light from a pattern of the mask to a wafer... | 04/13/2004 |
| 6721031 | Exposure apparatus This invention shortens a time required to purge, with inert gas, gas in a space (optical path space) through which exposure light passes, such as a space between a projection optical system and a substrate. The exposure apparatus includes a wafer stage (102)... | 04/13/2004 |
