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Inventor: Rajesh Baskaran


Address: Kalispell, MT
No. of patents: 5
Last patent issue date: 08/07/2012

NumberTitleIssue Date
8236159Electrolytic process using cation permeable barrier
Processes and systems for electrolytically processing a microfeature workpiece with a first processing fluid and an anode are described. Microfeature workpieces are electrolytically processed using a first processing fluid, an anode, a second processing fluid, and a...
08/07/2012
8123926Electrolytic copper process using anion permeable barrier
Processes and systems for electrolytically processing a microfeature workpiece with a first processing fluid and an anode are described. Microfeature workpieces are electrolytically processed using a first processing fluid, an anode, a second processing fluid, and a...
02/28/2012
7628898Method and system for idle state operation
Methods and systems for electrochemically processing microfeature workpieces are described herein. In one embodiment, a process for electrochemically treating a surface of a plurality of microfeature workpieces in an electrochemical treating chamber that includes a ...
12/08/2009
7252714Apparatus and method for thermally controlled processing of microelectronic workpieces
Apparatus and method for thermally controlled processing of microelectronic workpieces with liquids. An apparatus in accordance with and embodiment of the invention includes a process vessel configured to carry a processing liquid, such as an electroless processing ...
08/07/2007
7135404Method for applying metal features onto barrier layers using electrochemical deposition
The present invention is directed to a process for producing structures containing metallized features for use in microelectric workpieces. The process treats a barrier layer to promote the adhesion between the barrier layer and the metallized feature. Suitable mean...
11/14/2006
 
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