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| Number | Title | Issue Date |
| 6320213 | Diffusion barriers between noble metal electrodes and metallization layers, and integrated circuit and semiconductor devices comprising same A dynamic random access memory device (100) includes storage capacitors using a high dielectric constant material, such as, BaSrTiO3, SrBi2 Ta2 O9 and PbZrTiO3, for the capacitors' insulator. The devi... | 11/20/2001 |
| 6162712 | Platinum source compositions for chemical vapor deposition of platinum A platinum source reagent liquid solution, comprising: (i) at least one platinum source compound selected from the group consisting of compounds of the formulae: (A) RCpPt(IV)R'3 compounds, of the formula: ##STR1## wherein: R is selected from t... | 12/19/2000 |
| 6126996 | Metal complex source reagents for chemical vapor deposition A metalorganic complex of the formula: MAY X wherein: M is a y-valent metal; A is a monodentate or multidentate organic ligand coordinated to M which allows complexing of MAY with X; y is an integer having a value of 2, 3 or 4; each of the A ligands may ... | 10/03/2000 |
| 5961697 | Bulk storage and dispensing system for fluids A fluid storage and dispensing system includes a storage and dispensing vessel containing a solid-phase physical sorbent material for holding a sorbable fluid, and a motive transport assembly associated with the storage and dispensing vessel. The storage ... | 10/05/1999 |
| 5840897 | Metal complex source reagents for chemical vapor deposition A metalorganic complex of the formula: MAy X wherein: M is a y-valent metal; A is a monodentate or multidentate organic ligand coordinated to M which allows complexing of MAy with X; y is an integer having a value of 2, 3 or 4; each of the A l... | 11/24/1998 |
| 5820664 | Precursor compositions for chemical vapor deposition, and ligand exchange resistant metal-organic precursor solutions comprising same A metal source reagent liquid solution, comprising: (i) at least one metal coordination complex including a metal to which is coordinatively bound at least one ligand in a stable complex, wherein the ligand is selected from the group consisting of: ³... | 10/13/1998 |
| 5783716 | Platinum source compositions for chemical vapor deposition of platinum A platinum source reagent liquid solution, comprising: (i) at least one platinum source compound selected from the group consisting of compounds of the formulae: (A) RCpPt(IV)R'3 compounds, of the formula: ##STR1## wherein: R is selected from ... | 07/21/1998 |
| 5711816 | Source reagent liquid delivery apparatus, and chemical vapor deposition system comprising same A process and apparatus for delivering an involatile reagent in gaseous form, wherein an involatile reagent source liquid is flash vaporized on a vaporization matrix structure at elevated temperature. A carrier gas may be flowed past the flash vaporizatio... | 01/27/1998 |
| 5705443 | Etching method for refractory materials A plasma-assisted dry etching process for etching of a metal containing material layer on a substrate to remove the metal containing material from the substrate, comprising (i) plasma etching the metal containing material and, (ii) contemporaneously with ... | 01/06/1998 |
| 5679815 | Tantalum and niobium reagents useful in chemical vapor deposition processes, and process for depositing coatings using the same Niobium and tantalum compounds suitable for use as chemical vapor deposition source reagents, and a process for depositing niobium- or tantalum-containing coatings using the compounds. The compounds have formula M(OR1)x (R2 | 10/21/1997 |
| 5677002 | Chemical vapor deposition of tantalum- or niobium-containing coatings Niobium and tantalum compounds suitable for use as chemical vapor deposition source reagents, and a process for depositing niobium- or tantalum-containing coatings using the compounds. The compounds have formula M(OR1)x (R2 | 10/14/1997 |
| 5581436 | High-dielectric-constant material electrodes comprising thin platinum layers A preferred embodiment of this invention comprises a thin unreactive film (e.g. platinum 36) contacting a high-dielectric-constant material (e.g. barium strontium titanate 38) to an electrode. The thin unreactive film provides a stable conductive interfac... | 12/03/1996 |
| 5576928 | High-dielectric-constant material electrodes comprising thin platinum layers A preferred embodiment of this invention comprises a thin unreactive film (e.g. platinum 36) contacting a high-dielectric-constant material (e.g. barium strontium titanate 38) to an electrode. The thin unreactive film provides a stable conductive interfac... | 11/19/1996 |
| 5566045 | High-dielectric-constant material electrodes comprising thin platinum layers A preferred embodiment of this invention comprises a thin unreactive film (e.g. platinum 36) contacting a high-dielectric-constant material (e.g. barium strontium titanate 38) to an electrode. The thin unreactive film provides a stable conductive interfac... | 10/15/1996 |
| 5536323 | Apparatus for flash vaporization delivery of reagents A process and apparatus for delivering an involatile reagent in gaseous form, wherein an involatile reagent source liquid is flash vaporized on a vaporization matrix structure at elevated temperature. A carrier gas may be flowed past the flash vaporzation... | 07/16/1996 |
| 5453494 | Metal complex source reagents for MOCVD Metal organic chemical vapor deposition (MOCVD) source reagents useful for formation of metal-containing films, such as thin film copper oxide high temperature superconductor (HTSC) materials. The source reagents have the formula MAyX wherein: M is a meta... | 09/26/1995 |
| 5431957 | Apparatus and method for protection of pumps used for delivery of air- or moisture-sensitive liquids A means and method for protecting the moving parts of a pump that is used to pump air- or moisture-sensitive liquids, comprising blanketing the wetted parts of the pump with an inert medium and/or admixing the process liquid with a low vapor pressure liqu... | 07/11/1995 |
| 5362328 | Apparatus and method for delivering reagents in vapor form to a CVD reactor, incorporating a cleaning subsystem A means and method for protecting a source reagent vaporizer structure from the harmful effects of solid build-up occurring during its use in chemical vapor deposition (CVD). Vaporizer structures may be used to provide a means of transferring relatively i... | 11/08/1994 |
| 5337651 | Apparatus and method for protection of pumps used for delivery of air- or moisture-sensitive liquids A means and method for protecting the moving parts of a pump that is used to pump air- or moisture-sensitive liquids, comprising blanketing the wetted parts of the pump with an inert medium and/or admixing the process liquid with a low vapor pressure liqu... | 08/16/1994 |
