|6329274||Method of producing semiconductor device|
For forming electrical interlayer contact in a semiconductor device, an insulating film is formed on a first electrically conductive layer and then a contact hole is formed in the insulating film to expose a part of the first electroconductive, an activat...
|5250827||Semiconductor integrated circuit having a DRAM cell unit and a nonvolatile cell unit|
A high density nonvolatilized semiconductor integrated circuit is comprised of a Dynamic RAM (DRAM) cell unit and a nonvolatile cell unit. The DRAM cell unit is comprised of a first transistor having its gate connected to a word line, its source connected...