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| Number | Title | Issue Date |
| 7542141 | Stage controller and exposure method in which position of the stage is controlled based on position measurements of first and second laser interferometers An apparatus including a stage configured to be moved. A first laser interferometer measures a position of the stage in a first direction. A second laser interferometer measures a position of the stage in the first direction. A control unit (i) obtains a position of... | 06/02/2009 |
| 7411678 | Alignment apparatus, control method thereof, exposure apparatus and method of manufacturing semiconductor device by exposure apparatus controlled by the same control method An alignment apparatus which drives to a target position a stage capable of moving at least in a two-dimensional direction. A first measurement device and a second measurement device have a function of measuring positions of the stage in one direction from different... | 08/12/2008 |
| 7027128 | Exposure apparatus, maintenance method therefor, semiconductor device manufacturing method, and semiconductor manufacturing factory A scanning exposure apparatus for exposing a substrate to a pattern of a reticle. The apparatus includes an exposure system which exposes the substrate to the pattern with respect to a unit region, to which the pattern is transferred, of the substrate, by relatively... | 04/11/2006 |
| 7016049 | Alignment apparatus, control method therefor, exposure apparatus, device manufacturing method, semiconductor manufacturing factory, and exposure apparatus maintenance method An alignment apparatus including a first position measuring device and a second position measuring device which measure position information of an object to be controlled, a switching device which switches a position measuring system from the first position measurin... | 03/21/2006 |
| 6940584 | Exposure apparatus, maintenance method therefor, semiconductor device manufacturing method, and semiconductor manufacturing factory A scanning exposure apparatus for exposing a substrate to a pattern includes an exposure system which exposes the substrate to the pattern with respect to a unit region of the substrate to which the pattern is transferred, a determination system which determines whe... | 09/06/2005 |
| 6870599 | Exposure method and apparatus, and device manufacturing method A scanning exposure apparatus is provided that is capable of increasing the overlay accuracy. Every time a reticle is exchanged, a direction overlay correction table is updated. A control device for the exposure apparatus corrects the target positions (target locus)... | 03/22/2005 |
| 6704093 | Scanning exposure apparatus, scanning exposure method, and device manufacturing method A scanning exposure apparatus transfers a pattern of a master to a substrate with slit-shaped exposure light while a master stage holding the master and a substrate stage holding the substrate are moved. The apparatus includes a measurement unit arranged ... | 03/09/2004 |
| 6657703 | Exposure apparatus, maintenance method therefor, semiconductor device manufacturing method, and semiconductor manufacturing factory An exposure apparatus which has a stage for aligning a substrate surface to an imaging plane on the basis of a detection signal from a focus sensor, moves the substrate by the stage, transfers a projection pattern, and exposes the substrate. The apparatus... | 12/02/2003 |
