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| Number | Title | Issue Date |
| 8323868 | Bilayer systems including a polydimethylglutarimide-based bottom layer and compositions thereof Bilayer systems include a bottom layer formed of polydimethylglutarimide, an acid labile dissolution inhibitor and a photoacid generator. The bilayer system can be exposed and developed in a single exposure and development process. ... | 12/04/2012 |
| 8262961 | Aromatic vinyl ether based reverse-tone step and flash imprint lithography A molding composition and a method of forming an pattern. The method includes forming on a substrate a molding layer of a molding composition of aromatic divinyl ethers; pressing the template into the molding layer, the template having a relief pattern, the molding ... | 09/11/2012 |
| 8236482 | Photoresist compositions and methods of use in high index immersion lithography The present invention relates to a composition comprising a photoresist polymer and a fluoropolymer. In one embodiment, the fluoropolymer comprises a first monomer having a pendant group selected from alicyclic bis-hexafluoroisopropanol and aryl bis-hexafluoroisopro... | 08/07/2012 |
| 8128832 | Processes and materials for step and flash imprint lithography A method of forming an image. The method includes: a transfer layer on a substrate; forming on the transfer layer, an etch barrier layer; pressing a template having a relief pattern into the etch barrier layer; exposing the etch barrier layer to actinic radiation fo... | 03/06/2012 |
| 8088873 | Topcoat composition A topcoat composition. The topcoat composition includes a fluorine-containing polymer and a casting solvent that includes an alcohol. ... | 01/03/2012 |
| 8053537 | Method for using a topcoat composition A method of forming an image on a photoresist. The method includes: forming a photoresist over a substrate; applying a topcoat composition, the topcoat composition comprising at least one fluorine-containing polymer and a casting solvent, onto the photoresist; remov... | 11/08/2011 |
| 8003309 | Photoresist compositions and methods of use in high index immersion lithography The present invention relates to a composition comprising a photoresist polymer and a fluoropolymer. In one embodiment, the fluoropolymer comprises a first monomer having a pendant group selected from alicyclic bis-hexafluoroisopropanol and aryl bis-hexafluoroisopro... | 08/23/2011 |
| 7993812 | Calixarene blended molecular glass photoresists and processes of use Photoresist compositions include a blend of at least one fully protected calix[4]resorcinarene and at least one unprotected calix[4]resorcinarene, wherein the fully protected calix[4]resorcinarene has phenolic groups protected with acid labile protective groups; a p... | 08/09/2011 |
| 7947425 | Fluorinated vinyl ethers, copolymers thereof, and use in lithographic photoresist compositions Copolymers prepared by copolymerization of at least one fluorinated vinyl ether are provided. In one embodiment, the at least one fluorinated vinyl ether comprises ethylene directly substituted at an olefinic carbon atom with a moiety —OR* and optionally substitut... | 05/24/2011 |
| 7828986 | Forming surface features using self-assembling masks A method. A combination is provided of a block copolymer and additional material. The copolymer includes a first block of a first polymer covalently bonded to a second block of a second polymer. The additional material is miscible with the first polymer. The first p... | 11/09/2010 |
| 7749422 | Release layer for imprinted photocationic curable resins An imprint process comprising coating a selected surface of a micropatterned template with a release composition having a basic reactive moiety; wherein the template is transparent to UV radiation; imprinting the template onto a photocationically curable composition... | 07/06/2010 |
| 7728089 | Topcoat compositions and methods of use thereof A first aspect of the present invention is a topcoat composition, comprising: a copolymer represented by the formula (2): wherein n and m represent respective molar fractions such that n+m=1. ... | 06/01/2010 |
| 7608382 | Method of controlling the differential dissolution rate of photoresist compositions, polycyclic olefin polymers and monomers used for making such polymers A photoresist composition encompassing a polymer having at least one polycyclic olefin repeat unit having a desired exo mole percent is provided, where the repeat unit is derived from a polycyclic olefin monomer having the desired exo mole percent. Such polymers hav... | 10/27/2009 |
| 7488771 | Stabilization of vinyl ether materials A stable viscosity coating composition, a method of forming the stable viscosity coating composition and a method for using the stable viscosity coating composition in a micro-molding imprint lithographic process, such as Step and Flash Imprint Lithography is disclo... | 02/10/2009 |
| 7479364 | Copolymer for use in chemical amplification resists A copolymer is provided for use in a lithographic photoresist composition, particularly a chemical amplification photoresist. In a preferred embodiment, the copolymer is substantially transparent to deep ultraviolet radiation, i.e., radiation of a wavelength less th... | 01/20/2009 |
| 7473749 | Preparation of topcoat compositions and methods of use thereof A topcoat composition that includes a fluorine-containing polymer and a casting solvent selected from an alcohol is provided. Also provided is a method of forming an image on a photoresist that includes forming a photoresist over a substrate; applying a topcoat comp... | 01/06/2009 |
| 7465837 | Fluorinated vinyl ethers, copolymers thereof, and use in lithographic photoresist compositions Fluorinated vinyl ethers are provided having the structure of formula (I) the structure of formula (I) wherein at least one of X and Y is a fluorine atom, and L, R1, R2, R3, R4 ar... | 12/16/2008 |
| 7419611 | Processes and materials for step and flash imprint lithography A method of forming an image. The method includes: a transfer layer on a substrate; forming on the transfer layer, an etch barrier layer; pressing a template having a relief pattern into the etch barrier layer; exposing the etch barrier layer to actinic radiation fo... | 09/02/2008 |
| 7358035 | Topcoat compositions and methods of use thereof A topcoat composition that includes a fluorine-containing polymer and a casting solvent selected from the group consisting of α,α,α-trifluorotoluene, 2,2,3,3,4,4,5,5-octafluoropentyl-1,1,2,2-tetrafluoroethyl ether (OFP-TFEE), and a mixture consisting of a hydroph... | 04/15/2008 |
| 7358027 | Copolymer for use in chemical amplification resists A copolymer is provided for use in a lithographic photoresist composition, particularly a chemical amplification photoresist. In a preferred embodiment, the copolymer is substantially transparent to deep ultraviolet radiation, i.e., radiation of a wavelength less th... | 04/15/2008 |
| 7341816 | Method of controlling the differential dissolution rate of photoresist compositions, polycyclic olefin polymers and monomers used for making such polymers A photoresist composition encompassing a polymer having at least one polycyclic olefin repeat unit having a desired exo mole percent is provided, where the repeat unit is derived from a polycyclic olefin monomer having the desired exo mole percent. Such polymers hav... | 03/11/2008 |
| 7150957 | Fluorinated vinyl ethers, copolymers thereof, and use in lithographic photoresist compositions Fluorinated vinyl ethers are provided having the structure of formula (I) the structure of formula (I) wherein at least one of X and Y is a fluorine atom, and L, R1, R2, R3, R | 12/19/2006 |
| 6964840 | Radiation-sensitive resin composition A radiation-sensitive resin composition comprising an acid-labile group-containing resin and a photoacid generator is disclosed. The resin has a structure of the formula (1), wherein R1 represents a hydrogen... | 11/15/2005 |
| 6800414 | Radiation-sensitive resin composition A radiation-sensitive resin composition comprising an acid-labile group-containing resin and a photoacid generator is disclosed. The resin has a structure of the formula (1), wherein R1 represents a hydrogen a... | 10/05/2004 |
| 6794110 | Polymer blend and associated methods of preparation and use A polymer blend is provided for use in a lithographic photoresist composition, particularly a chemical amplification photoresist. In a preferred embodiment, the polymer blend is substantially transparent to deep ultraviolet radiation, i.e., radiation of a wavelength... | 09/21/2004 |
| 6770413 | Hydroxyphenyl copolymers and photoresists comprising same The present invention relates to new copolymers and use of such copolymer as a resin binder component for photoresist compositions, particularly chemically-amplified positive-acting resists. Polymers of the invention include repeat units of 1) meta-hydroxystyrene gr... | 08/03/2004 |
| 6730452 | Lithographic photoresist composition and process for its use A lithographic photoresist composition is provided that can be used as a chemical amplification photoresist. In a preferred embodiment, the composition is substantially transparent to deep ultraviolet radiation, i.e., radiation of a wavelength less than 250 n... | 05/04/2004 |
| 6627391 | Resist compositions containing lactone additives Acid-catalyzed positive resist compositions which are imageable with 193 nm radiation and are developable to form resist structures of high resolution and high etch resistance are enabled by the use of a combination of (a) an imaging polymer comprising a ... | 09/30/2003 |
| 6610456 | Fluorine-containing styrene acrylate copolymers and use thereof in lithographic photoresist compositions Copolymers prepared by radical polymerization of a fluorine-containing aromatic monomer and an acrylate-based comonomer that may or may not be fluorinated. The polymers are useful in lithographic photoresist compositions, particularly chemical amplificati... | 08/26/2003 |
| 6548219 | Substituted norbornene fluoroacrylate copolymers and use thereof in lithographic photoresist compositions Copolymers prepared by radical polymerization of a substituted norbornene monomer and a fluoromethacrylic acid, fluoromethacrylonitrile, or fluoromethacrylate comonomer are provided. The polymers are useful in lithographic phtoresist compositions, particu... | 04/15/2003 |
| 6509134 | Norbornene fluoroacrylate copolymers and process for the use thereof Novel norbornene fluoroacrylate copolymers are provided. The polymers are useful in lithographic photoresist compositions, particularly chemical amplification resists. In a preferred embodiment, the polymers are substantially transparent to deep ultraviol... | 01/21/2003 |
| 6420503 | Norbornene sulfonamide polymers The invention is directed to polymers containing a repeating unit derived from a norbornene sulfonamide. These may be addition polymers which include copolymers with one or more comonomers such as norbornene, ethylene, an acrylate or sulfur dioxide or car... | 07/16/2002 |
| 6391521 | Resist compositions containing bulky anhydride additives Acid-catalyzed positive resist compositions which are imageable with 193 nm radiation and are developable to form resist structures of high resolution and high etch resistance are enabled by the use of a combination of (a) an imaging polymer comprising a ... | 05/21/2002 |
| 6365321 | Blends of hydroxystyrene polymers for use in chemically amplified positive resist formulations A photoresist binder composition comprising a homogeneous blend of (i) a hydroxystyrene copolymer comprising a first monomer that is optionally substituted hydroxystyrene and a second monomer containing an acid labile group, preferably pendant to the poly... | 04/02/2002 |
| 6251560 | Photoresist compositions with cyclic olefin polymers having lactone moiety Acid-catalyzed positive photoresist compositions which are imageable with 193 nm radiation (and possibly other radiation) and are developable to form photoresist structures of improved development characteristics and improved etch resistance are enabled b... | 06/26/2001 |
| 6203965 | Photoresist comprising blends of photoacid generators The invention provides new photoresist compositions that contain a resin binder and a blend of photoacid generators. Photoacid generator blends of the invention produce photoacids that differ in acid strength and/or size. A specific composition comprises ... | 03/20/2001 |
| 6165673 | Resist composition with radiation sensitive acid generator The invention relates to a polymeric, radiation-sensitive resist composition comprising (i) iodonium sulfonate radiation sensitive acid generator; (ii) a polymer; and (iii) an acid labile compound.... | 12/26/2000 |
| 6153696 | Process for forming carbonates of hydroxyaromatic compounds A process for the stoichiometric carbonation of a hydroxyaromatic material is provided which comprises the steps of (a) mixing together in a reaction vessel (1) a hydroxyaromatic material, (2) a sufficient amount of a dialkyl dicarbonate to give the desir... | 11/28/2000 |
| 6093517 | Calixarenes for use as dissolution inhibitors in lithographic photoresist compositions A lithographic photoresist composition is provided containing novel calixarene compounds, particularly calix[4]resorcinarenes that are partially or wholly protected with acid-labile functionalities, as dissolution inhibitors. Also provided is a process fo... | 07/25/2000 |
| 6074800 | Photo acid generator compounds, photo resists, and method for improving bias Several mid UV photo acid generators (PAGs), a chemically amplified photo resist (CAMP), and method for improving nested to isolated line bias are provided. Similarly, photo speed may also be improved. Unlike conventional mid UV PAGs, the present inventio... | 06/13/2000 |
