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| Number | Title | Issue Date |
| 8313635 | Bare aluminum baffles for resist stripping chambers Bare aluminum baffles are adapted for resist stripping chambers and include an outer aluminum oxide layer, which can be a native aluminum oxide layer or a layer formed by chemically treating a new or used bare aluminum baffle to form a thin outer aluminum oxide laye... | 11/20/2012 |
| 8276604 | Peripherally engaging electrode carriers and assemblies incorporating the same In accordance with one embodiment of the present disclosure, an assembly is provided comprising a multi-component electrode and a peripherally engaging electrode carrier. The peripherally engaging electrode carrier comprises a carrier frame and a plurality of recipr... | 10/02/2012 |
| 8221552 | Cleaning of bonded silicon electrodes Methods of cleaning plasma processing chamber components include contacting surfaces of the components with a cleaning solution, while avoiding damage of other surfaces or areas of the components by the cleaning solution. An exemplary plasma processing chamber compo... | 07/17/2012 |
| 8216388 | Extending storage time of removed plasma chamber components prior to cleaning thereof A method of extending storage time prior to cleaning a component of a plasma chamber is provided. The method comprises removing the component from the chamber, covering a thermal spray coating on the component while the surface is exposed to atmospheric air, storing... | 07/10/2012 |
| 8171877 | Backside mounted electrode carriers and assemblies incorporating the same A carrier assembly is provided comprising a backside mounted electrode carrier and electrode mounting hardware. The backside mounted electrode carrier comprises an electrode accommodating aperture, which in turn comprises a sidewall structure that is configured to l... | 05/08/2012 |
| 8097105 | Extending lifetime of yttrium oxide as a plasma chamber material Two methods of extending the lifetime of yttrium oxide as a plasma chamber material are provided. One method comprises making a three-layer component of a plasma processing chamber by co-sintering a dual-layer green body where one layer comprises ceramic particles a... | 01/17/2012 |
| 8075701 | Processes for reconditioning multi-component electrodes A process for reconditioning a multi-component electrode comprising a silicon electrode bonded to an electrically conductive backing plate is provided. The process comprises: (i) removing metal ions from the multi-component electrode by soaking the multi-component e... | 12/13/2011 |
| 8075703 | Immersive oxidation and etching process for cleaning silicon electrodes A process for cleaning a silicon electrode is provided where the silicon electrode is soaked in an agitated aqueous detergent solution and rinsed with water following removal from the aqueous detergent solution. The rinsed silicon electrode is then soaked in an agit... | 12/13/2011 |
| 7976641 | Extending storage time of removed plasma chamber components prior to cleaning thereof A method of extending storage time prior to cleaning a component of a plasma chamber is provided. The method comprises removing the component from the chamber, covering a thermal spray coating on the component while the surface is exposed to atmospheric air, storing... | 07/12/2011 |
| 7811409 | Bare aluminum baffles for resist stripping chambers Bare aluminum baffles are adapted for resist stripping chambers and include an outer aluminum oxide layer, which can be a native aluminum oxide layer or a layer formed by chemically treating a new or used bare aluminum baffle to form a thin outer aluminum oxide laye... | 10/12/2010 |
| 7736441 | Cleaning fixtures and methods of cleaning electrode assembly plenums According to one embodiment of the present invention, a method of cleaning one or more fluid plenums of an electrode assembly is provided. According to the method, a plurality of fluid ports in communication with the fluid plenum are isolated and differentiated into... | 06/15/2010 |
| 7638004 | Method for cleaning microwave applicator tube A method of cleaning a microwave plasma applicator tube as described herein includes preparing a microwave plasma applicator for cleaning. A general cleaning of the plasma applicator tube is performed using an organic solvent wash and an ultrapure water wash. Select... | 12/29/2009 |
| 6770214 | Method of reducing aluminum fluoride deposits in plasma etch reactor A method of reducing aluminum fluoride deposits in a plasma etch reactor. The deposits can be reduced during a cleaning step wherein the cleaning gas includes BCl3 energized into a plasma such that dissociated and undissociated BCl3 are formed ... | 08/03/2004 |
| 6350697 | Method of cleaning and conditioning plasma reaction chamber A method for cleaning and conditioning interior surfaces of a plasma chamber in which substrates such as silicon wafers are processed. The method includes cleaning the chamber such as by a wet clean or in-situ plasma clean, introducing a conditioning gas ... | 02/26/2002 |
