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| Number | Title | Issue Date |
| 7697129 | Systems and methods for inspecting a wafer with increased sensitivity Systems and methods for inspecting a wafer with increased sensitivity are provided. One system includes an inspection subsystem configured to direct light to a spot on the wafer and to generate output signals responsive to light scattered from the spot on the wafer.... | 04/13/2010 |
| 7554656 | Methods and systems for inspection of a wafer Methods and systems for inspection of a wafer are provided. One method includes illuminating the wafer with light at a first wavelength that penetrates into the wafer and light at a second wafer that does not substantially penetrate into the wafer. The method also i... | 06/30/2009 |
| 7489393 | Enhanced simultaneous multi-spot inspection and imaging A system and method for inspection is disclosed. The design includes focusing illumination beams of radiation at an optical axis to an array of illuminated elongated spots on the surface at oblique angle(s) of incidence to the surface, performing a linear scan along... | 02/10/2009 |
| 7463349 | Systems and methods for determining a characteristic of a specimen Systems and methods for determining a characteristic of a specimen are provided. One system includes an illumination subsystem configured to direct light to a first set of spots on the specimen at a normal angle of incidence and to simultaneously direct light to a s... | 12/09/2008 |
| 7436505 | Computer-implemented methods and systems for determining a configuration for a light scattering inspection system Computer-implemented methods and systems for determining a configuration for a light scattering inspection system are provided. One computer-implemented method includes determining a three-dimensional map of signal-to-noise ratio values for data that would be acquir... | 10/14/2008 |
| 7372559 | Systems and methods for inspecting a wafer with increased sensitivity Systems and methods for inspecting a wafer with increased sensitivity are provided. One system includes an inspection subsystem configured to direct light to a spot on the wafer and to generate output signals responsive to light scattered from the spot on the wafer.... | 05/13/2008 |
| 7304310 | Methods and systems for inspecting a specimen using light scattered in different wavelength ranges Methods and systems for inspecting a specimen are provided. One method includes directing ultraviolet light to a specimen. The method also includes detecting light scattered from the specimen having a selected wavelength range. In addition, the method includes detec... | 12/04/2007 |
