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Inventor: Akimitsu Nakaue


Address: Kobe, JP
No. of patents: 4
Last patent issue date: 04/19/1994

NumberTitleIssue Date
5304461Process for the selective deposition of thin diamond film by gas phase synthesis
Thin diamond films can be selectively deposited imagewise on a substrate by gas phase synthesis. The substrate may be either a silicon substrate or a basal thin diamond film formed beforehand on a substrate by gas phase synthesis. Where a silicon substrat...
04/19/1994
5086014Schottky diode manufacturing process employing the synthesis of a polycrystalline diamond thin film
A schottky diode manufacturing process employing diamond film comprises forming a B-doped p-type polycrystalline diamond film on a low-resistance p-type Si substrate by CVD using a source gas consisting of CH4, H2 and B2 H...
02/04/1992
5066938Diamond film thermistor
A diamond thin film thermistor having a substrate, an electrically insulating diamond layer formed on the substrate by vapor-phase synthesis, a semiconducting diamond layer as a temperature-sensing part on the electrically insulating diamond layer by vapo...
11/19/1991
4874939Method and apparatus for detecting position/variance of input light using linear and quadratic outputs
An apparatus for detecting position/variance of input light is disclosed which includes a photoelectric conversion device receiving input light constituted of a first resistive layer formed of a first photoelectric conversion material and a second resisti...
10/17/1989
 
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