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Inventor: Pang-Dow Foo


Address: Singapore, SG
No. of patents: 2
Last patent issue date: 12/23/2003

NumberTitleIssue Date
6667516RF LDMOS on partial SOI substrate
In the prior art LDMOSFET devices capable of handling high power have been made by locating the source contact on the bottom surface of the device, allowing for good heat sinking, with connection to the source region being made through a sinker. However, ...
12/23/2003
6461902RF LDMOS on partial SOI substrate
In the prior art LDMOSFET devices capable of handling high power have been made by locating the source contact on the bottom surface of the device, allowing for good heat sinking, with connection to the source region being made through a sinker. However, ...
10/08/2002
 
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