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| Number | Title | Issue Date |
| 6682876 | Thinner composition and method of stripping a photoresist using the same A thinner composition is effective in removing a variety of photoresists, and includes propylene glycol mono-methyl ether acetate, ethyl 3-ethoxy propionate and at least one of γ-butyro lactone and propylene glycol mono-methyl ether. The thinner composit... | 01/27/2004 |
| 6589719 | Photoresist stripper compositions A photoresist stripper composition is made up of a mixture of an acetic acid ester, γ-butyrolactone (GBL), and a non-acetate ester or a poly alkyl alcohol derivative. The acetic acid ester may be at least one of n-butyl acetate, amyl acetate, ethyl aceto... | 07/08/2003 |
