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| Application No. | Application Title | Issue Date |
| 20110311725 | APPARATUS AND METHODS FOR SAFELY PROVIDING HAZARDOUS REACTANTS An apparatus for providing a reactant comprises a reactant space and a reservoir space. The reactant space comprises a chemical complex capable of evolving the reactant when heated. The reservoir space, in turn, is in gas communication with the reactant space. The appar... | 12/22/2011 |
| 20110310526 | CAPACITORS WITH HIGH ENERGY STORAGE DENSITY AND LOW ESR Electrostatic capacitors with high capacitance density and high-energy storage are implemented over conventional electrolytic capacitor anode substrates using highly conformal contact layers deposited by atomic layer deposition. Capacitor films that are suitable for ene... | 12/22/2011 |
| 20110206909 | COATINGS FOR SUPPRESSING METALLIC WHISKERS A coating is formed by depositing the coating on a metallic feature at a deposition temperature. Subsequently, the deposited coating and the metallic feature are cooled below the deposition temperature. The coating is chosen such that this cooling step causes the coatin... | 08/25/2011 |
| 20110070141 | DEPOSITION METHOD AND APPARATUS A method of depositing a material on a substrate comprises placing a substrate into a process space in fluidic communication with a Gaede pump stage (GPS). A precursor gas is then injected into the process space while injecting a draw gas at a draw gas flow rate into th... | 03/24/2011 |
| 20100301011 | APPARATUS AND METHOD FOR DOWNSTREAM PRESSURE CONTROL AND SUB-ATMOSPHERIC REACTIVE GAS ABATEMENT A sub-atmospheric downstream pressure control apparatus includes a first flow restricting element (FRE); a pressure control chamber (PCC) located in serial fluidic communication downstream from the first FRE; a second FRE located in serial fluidic communication downstre... | 12/02/2010 |
| 20100166957 | PERIMETER PARTITION-VALVE WITH PROTECTED SEALS AND ASSOCIATED SMALL SIZE PROCESS CHAMBERS AND MULTIPLE CHAMBER SYSTEMS A seal-protected perimeter partition valve apparatus defines a vacuum and pressure sealed space within a larger space confining a substrate processing chamber with optimized geometry, minimized footprint, and 360° substrate accessibility. A compact perimeter partitione... | 07/01/2010 |
| 20100129548 | ALD APPARATUS AND METHOD Improved apparatus and method for SMFD ALD include a method designed to enhance chemical utilization as well as an apparatus that implements lower conductance out of SMFD-ALD process chamber while maintaining full compatibility with standard wafer transport. Improved SM... | 05/27/2010 |
| 20100043888 | ALD APPARATUS AND METHOD An apparatus and method for atomic layer deposition with improved efficiency of both chemical dose and purge is presented. The apparatus includes an integrated equipment and procedure for chamber maintenance.... | 02/25/2010 |
| 20100003404 | ALD METHOD AND APPARATUS A method and an apparatus for executing efficient and cost-effective Atomic Layer Deposition (ALD) at low temperatures are presented. ALD films such as oxides and nitrides are produced at low temperatures under controllable and mild oxidizing conditions over substrates ... | 01/07/2010 |
| 20070269983 | Ald Apparatus and Method Improved apparatus and method for SMFD ALD include a method designed to enhance chemical utilization as well as an apparatus that implements lower conductance out of SMFD-ALD process chamber while maintaining full compatibility with standard wafer transport. Improved SM... | 11/22/2007 |
| 20070187634 | Fail-safe pneumatically actuated valve with fast time response and adjustable conductance Apparatus and method for fail-safe high-speed-pneumatic valve is disclosed. Fail-safe dependability is provided by a spring-loaded normally-closed pneumatic actuator. When the spring-loaded actuator is pressurized, the normally closed mechanism is actuated to the valve ... | 08/16/2007 |
| 20070051312 | Perimeter partition-valve with protected seals and associated small size process chambers and multiple chamber systems A seal-protected perimeter partition valve apparatus (450) defines a vacuum and pressure sealed space (401) within a larger space (540) confining a substrate processing chamber with optimized geometry, minimized footprint and 360° substrate accessi... | 03/08/2007 |
| 20070012402 | Apparatus and method for downstream pressure control and sub-atmospheric reactive gas abatement A sub-atmospheric downstream pressure control apparatus (200) includes a first flow restricting element (FRE) (202); a pressure control chamber (PCC) (204) located in serial fluidic communication downstream from the first FRE; a second FRE (206 | 01/18/2007 |
