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| Application No. | Application Title | Issue Date |
| 20120069309 | FLUID HANDLING STRUCTURE, MODULE FOR AN IMMERSION LITHOGRAPHIC APPARATUS, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD A fluid handling structure successively having, at a boundary from a space configured to contain immersion fluid to a region external to the fluid handling structure: a meniscus pinning feature to resist passage of immersion fluid in a radially outward direction from th... | 03/22/2012 |
| 20120008118 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD A liquid supply system for an immersion lithographic apparatus provides a laminar flow of immersion liquid between a final element of the projection system and a substrate. A control system minimizes the chances of overflowing and an extractor includes an array of outle... | 01/12/2012 |
| 20120008116 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD A liquid supply system for an immersion lithographic apparatus provides a laminar flow of immersion liquid between a final element of the projection system and a substrate. A control system minimizes the chances of overflowing and an extractor includes an array of outle... | 01/12/2012 |
| 20110310367 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid f... | 12/22/2011 |
| 20110299051 | FLUID SUPPLY SYSTEM, A LITHOGRAPHIC APPARATUS, A METHOD OF VARYING FLUID FLOW RATE AND A DEVICE MANUFACTURING METHOD A fluid supply system for a lithographic apparatus includes a first fluid flow path for fluid between a fluid source and a first component and a drain fluid flow path for fluid flow from a junction in the first fluid flow path to a drain component. A controller is provi... | 12/08/2011 |
| 20110285976 | LITHOGRAPHIC APPARATUS, FLUID HANDLING STRUCTURE FOR USE IN A LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD A lithographic apparatus including a fluid handling structure configured to contain immersion fluid in a space adjacent to an upper surface of the substrate table and/or a substrate located in a recess of the substrate table, a cover having a planar main body that, in u... | 11/24/2011 |
| 20110273695 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD A protrusion is provided on a barrier member which at least partly confines a liquid between a projection system and a substrate. The protrusion is closer to the projection system than other parts of the barrier member to promote a meniscus of liquid to adhere between t... | 11/10/2011 |
| 20110235008 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD An immersion lithographic apparatus is disclosed in which a gas knife is shaped and a liquid removal device is positioned to improve removal of liquid from the surface of the substrate.... | 09/29/2011 |
| 20110232878 | HEAT PIPE, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD A heat pipe to maintain an object at a substantially uniform temperature is disclosed. The heat pipe includes a chamber containing a liquid reservoir and a vapor space, part of the chamber being defined by a condensing surface, and a liquid transporter to apply a force ... | 09/29/2011 |
| 20110222033 | LITHOGRAPHIC APPARATUS AND METHOD A lithographic apparatus is disclosed that includes a substrate table configured to support a substrate on a substrate supporting area and a heater and/or temperature sensor on a surface adjacent the substrate supporting area.... | 09/15/2011 |
| 20110194084 | FLUID HANDLING STRUCTURE, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD A fluid handling structure for a lithographic apparatus, the fluid handling structure successively having, at a boundary from a space configured to comprise immersion fluid to a region external to the fluid handling structure: an extractor having at least one opening ar... | 08/11/2011 |
| 20110149258 | LITHOGRAPHIC APPARATUS AND A DEVICE MANUFACTURING METHOD An immersion lithographic apparatus is disclosed that includes a table having a surface and a sensor, or a target for a sensor, or both, the sensor and/or target having a first area which is lyophobic to immersion liquid and a second area which is lyophilic to immersion... | 06/23/2011 |
| 20110149257 | LITHOGRAPHIC APPARATUS AND A DEVICE MANUFACTURING METHOD An immersion lithographic apparatus is disclosed that has a fluid handling system configured to provide immersion liquid between a final element of a projection system and a surface which comprises, in cross-section, a feature, and an adjustment fluid source configured ... | 06/23/2011 |
| 20110075118 | HEAT PIPE, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD A lithographic apparatus is provided that includes a substrate holder configured to hold a substrate, and a heat pipe to maintain the substrate holder at a substantially uniform temperature. The heat pipe has a chamber containing a liquid reservoir and a vapor space, an... | 03/31/2011 |
| 20110069297 | LITHOGRAPHIC APPARATUS, COVERPLATE AND DEVICE MANUFACTURING METHOD A lithographic apparatus, including a substrate table configured to hold a substrate; a positioner configured to position the substrate table relative to a projection system, the positioner including a short stroke module configured to perform fine positioning movements... | 03/24/2011 |
| 20110069289 | LITHOGRAPHIC APPARATUS, COVERPLATE AND DEVICE MANUFACTURING METHOD An immersion lithographic apparatus, including: first and second objects which are spaced apart with a gap therebetween and on whose top surfaces immersion liquid is provided; and a gutter positioned under the gap and configured to collect any immersion liquid which pas... | 03/24/2011 |
| 20110051107 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD In an immersion lithography apparatus, ultrasonic waves are used to atomize liquid on a surface of the substrate.... | 03/03/2011 |
| 20110013169 | SUBSTRATE TABLE FOR A LITHOGRAPHIC APPARATUS, LITHOGRAPHIC APPARATUS, METHOD OF USING A SUBSTRATE TABLE AND DEVICE MANUFACTURING METHOD A cover is provided for a substrate table in an immersion lithographic apparatus that covers at least the gap between a substrate and a recess in a substrate table in which the substrate is received.... | 01/20/2011 |
| 20100321653 | LITHOGRAPHIC APPARATUS A barrier member is provided for use in immersion lithography. The barrier member includes an extractor assembly on a bottom surface configured to face the substrate. The extractor assembly includes a plate configured to split the space between a liquid removal device a... | 12/23/2010 |
| 20100321650 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD A lithographic apparatus is described having a liquid supply system configured to at least partly fill a space between a projection system of the lithographic apparatus and a substrate with liquid, a barrier member arranged to substantially contain the liquid within the... | 12/23/2010 |
| 20100283981 | IMMERSION LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD In an all-wet immersion lithographic apparatus, the immersion liquid is allowed to flow off an edge of the substrate table. The immersion liquid is moved with the substrate table during exposure. The motion of the immersion liquid may result in a disturbance and/or de-w... | 11/11/2010 |
| 20100245791 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD Methods and apparatus for maintaining the thermal equilibrium of a substrate and an immersion lithographic apparatus are disclosed using or having a timetable comprising information regarding the position, speed and/or acceleration of the substrate; and an evaporation c... | 09/30/2010 |
| 20100165319 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD An immersion lithographic projection apparatus is disclosed in which a liquid removal system surrounds a liquid supply system which provides liquid to a space between a projection system and a substrate. The liquid removal system is moveable relative to the liquid suppl... | 07/01/2010 |
| 20100157277 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD A liquid confinement structure configured to contain a liquid in a space between a projection system and a substrate has a recess in its lower surface which is open to both a relatively low pressure source and a relatively high pressure source and through which liquid a... | 06/24/2010 |
| 20100149514 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid f... | 06/17/2010 |
| 20100060868 | FLUID HANDLING STRUCTURE, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTUIRNG METHOD A fluid handling structure is disclosed which is designed for all wet immersion lithography. The fluid handling structure has a first opening to provide fluid to a space between a final element of a projection system and a substrate and/or substrate table, a barrier to ... | 03/11/2010 |
| 20100053574 | Liquid Immersion Lithography System Comprising a Tilted Showerhead Relative to a Substrate A liquid immersion lithography system includes projection optics (PL) and a showerhead (604). The projection optics are configured to expose a substrate (W) with a patterned beam. The showerhead includes a first nozzle (610) and a second nozzle (612... | 03/04/2010 |
| 20100045950 | LITHOGRAPHIC APPARATUS, DRYING DEVICE, METROLOGY APPARATUS AND DEVICE MANUFACTURING METHOD An immersion lithographic apparatus is described in which a two-phase flow is separated into liquid-rich and gas-rich flows by causing the liquid-rich flow to preferentially flow along a surface.... | 02/25/2010 |
| 20090296056 | SUBSTRATE TABLE, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD A table is disclosed in which measures are taken to seal between the table and an edge of an object, in use, supported on the table. In particular, a capillary passage is formed between the object on the table and the table itself. A meniscus pinning feature and/or the ... | 12/03/2009 |
| 20090296068 | SUBSTRATE TABLE, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD A table is disclosed in which an opening is provided for the provision of immersion fluid onto a top surface of the table. In an embodiment, there are two such openings. The first of the openings surrounds a substrate support of the table and the second of the openings ... | 12/03/2009 |
| 20090225289 | LITHOGRAPHIC APPARATUS AND METHODS An immersion lithographic apparatus is described in which a member is provided above the surface of the substrate and the substrate table. Immersion liquid is provided between the substrate table and the substrate and the member. In an embodiment, a beam of radiation pa... | 09/10/2009 |
| 20090168037 | Lithographic apparatus and device manufacturing method An immersion lithographic projection apparatus is disclosed. The apparatus includes a substrate table for holding a substrate and a liquid supply system for supply liquid to the substrate. The apparatus is constructed and arranged to allow the liquid to flow off the sub... | 07/02/2009 |
| 20090161083 | Lithographic apparatus and device manufacturing method The use of electro wetting to control the behavior of immersion liquid within an immersion lithographic apparatus is disclosed.... | 06/25/2009 |
| 20080273182 | Lithographic apparatus and device manufacturing method A protrusion is provided on a barrier member which at least partly confines a liquid between a projection system and a substrate. The protrusion is closer to the projection system than other parts of the barrier member to promote a meniscus of liquid to adhere between t... | 11/06/2008 |
| 20080123071 | Lithographic apparatus, immersion projection apparatus and device manufacturing method A control system configured to control a position of a fluid supply system, the fluid supply system constructed and arranged to supply a fluid between a substrate and a projection system, the substrate positioned with a substrate stage, the control system including a co... | 05/29/2008 |
| 20060285096 | Lithographic apparatus and device manufacturing method Methods and apparatus for maintaining the thermal equilibrium of a substrate and an immersion lithographic apparatus are disclosed using or having a timetable comprising information regarding the position, speed and/or acceleration of the substrate; and an evaporation c... | 12/21/2006 |
| 20060215131 | Lithographic apparatus, immersion projection apparatus and device manufacturing method A lithographic apparatus comprises a substrate table to hold a substrate and a projection system to project a patterned radiation beam onto a target portion of the substrate. The lithographic apparatus further comprises a fluid supply system to supply a fluid between th... | 09/28/2006 |
| 20060103817 | Lithographic apparatus and device manufacturing method In an immersion lithography apparatus in which, for example, immersion liquid is supplied to a localized space, a plate is provided to divide the space into two parts. Such a division of the space may facilitate reduction of stray radiation, a temperature gradient, and ... | 05/18/2006 |
| 20060061739 | Lithographic apparatus and device manufacturing method In a scanning immersion lithographic apparatus, immersion liquid is supplied on one side of the space between the projection system and the substrate and drained on the other side so that the flow of liquid is substantially perpendicular to the scan direction. ... | 03/23/2006 |
