Did You Know...
...that Robert Adler has the dubious distinction of being the Father of the Couch Potato? Back in 1955 Adler was employed by what was then Zenith Radio Corp., where he was charged to invent something that would allow viewers to turn down the TV volume without leaving their chairs. After a series of flops (such as a wired contraption that people tripped over), Adler hit on the idea of using sound waves. Thus the Remote Control was born...
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| Application No. | Application Title | Issue Date |
| 20120106935 | HEATING LAMP SYSTEM AND METHODS THEREOF Embodiments of the invention generally relate to apparatuses and methods for chemical vapor deposition (CVD). In one embodiment, a heating lamp assembly for a CVD reactor system is provided which includes a lamp housing disposed on an upper surface of a support base and... | 05/03/2012 |
| 20120067286 | VAPOR DEPOSITION REACTOR SYSTEM AND METHODS THEREOF Embodiments of the invention generally relate to apparatuses and methods for chemical vapor deposition (CVD) processes. In one embodiment, a CVD reactor has a reactor lid assembly disposed on a reactor body and containing a first showerhead assembly, an isolator assembl... | 03/22/2012 |
| 20120067282 | REACTOR LID ASSEMBLY FOR VAPOR DEPOSITION Embodiments of the invention generally relate to apparatuses for chemical vapor deposition (CVD) processes. In one embodiment, a reactor lid assembly for vapor deposition is provided which includes a first showerhead assembly and an isolator assembly disposed next to ea... | 03/22/2012 |
| 20110308463 | CHEMICAL VAPOR DEPOSITION REACTOR WITH ISOLATED SEQUENTIAL PROCESSING ZONES A chemical vapor deposition reactor and system has a housing, a substrate transport apparatus and a plurality of fixed processing zones. The processing zones include one or more chemical vapor deposition zones, each having an independent reactant gas supply. Each chemic... | 12/22/2011 |
| 20100229793 | SHOWERHEAD FOR VAPOR DEPOSITION Embodiments of the invention generally relate to apparatuses for chemical vapor deposition (CVD) processes. In one embodiment, a showerhead assembly is provided which includes a body having a centralized channel extending through upper and lower portions of the body and... | 09/16/2010 |
| 20100212591 | REACTOR LID ASSEMBLY FOR VAPOR DEPOSITION Embodiments of the invention generally relate to apparatuses for chemical vapor deposition (CVD) processes. In one embodiment, a reactor lid assembly for vapor deposition is provided which includes a first showerhead assembly and an isolator assembly disposed next to ea... | 08/26/2010 |
| 20100209620 | METHOD FOR VAPOR DEPOSITION Embodiments of the invention generally relate to methods for chemical vapor deposition (CVD) processes. In one embodiment, a method for processing a wafer within a vapor deposition reactor is provided which includes heating at least one wafer disposed on a wafer carrier... | 08/19/2010 |
| 20100209626 | METHODS FOR HEATING WITH LAMPS Embodiments of the invention generally relate to methods for chemical vapor deposition (CVD) processes. In one embodiment, a method for heating a substrate or a substrate susceptor within a vapor deposition reactor system includes exposing a lower surface of a substrate... | 08/19/2010 |
| 20100209082 | HEATING LAMP SYSTEM Embodiments of the invention generally relate to apparatuses for chemical vapor deposition (CVD) processes. In one embodiment, a heating lamp assembly for a vapor deposition reactor system is provided which includes a lamp housing disposed on an upper surface of a suppo... | 08/19/2010 |
| 20100206229 | VAPOR DEPOSITION REACTOR SYSTEM Embodiments of the invention generally relate to apparatuses for chemical vapor deposition (CVD) processes. In one embodiment, a CVD reactor is provided which includes a reactor lid assembly disposed on a reactor body and containing a first showerhead assembly, an isola... | 08/19/2010 |
| 20100206235 | WAFER CARRIER TRACK Embodiments of the invention generally relate to apparatuses for chemical vapor deposition (CVD) processes. In one embodiment, a wafer carrier track for levitating and traversing a wafer carrier within a vapor deposition reactor system is provided which includes upper a... | 08/19/2010 |
| 20100132780 | PHOTOVOLTAIC DEVICE Methods and apparatus are provided for converting electromagnetic radiation, such as solar energy, into electric energy with increased efficiency when compared to conventional solar cells. A photovoltaic (PV) unit, according to embodiments of the invention, may have a v... | 06/03/2010 |
| 20100126571 | PHOTOVOLTAIC DEVICE WITH INCREASED LIGHT TRAPPING Methods and apparatus are provided for converting electromagnetic radiation, such as solar energy, into electric energy with increased efficiency when compared to conventional solar cells. A photovoltaic (PV) device may incorporate front side and/or back side light trap... | 05/27/2010 |
| 20100126572 | PHOTOVOLTAIC DEVICE WITH BACK SIDE CONTACTS Methods and apparatus for converting electromagnetic radiation, such as solar energy, into electric energy with increased efficiency when compared to conventional solar cells are provided. A photovoltaic (PV) device generally includes a window layer; an absorber layer d... | 05/27/2010 |
| 20100126552 | INTEGRATION OF A PHOTOVOLTAIC DEVICE Methods and apparatus are provided for converting electromagnetic radiation, such as solar energy, into electric energy with increased efficiency when compared to conventional solar cells. A photovoltaic (PV) unit may have all electrical contacts positioned on the back ... | 05/27/2010 |
| 20100126570 | THIN ABSORBER LAYER OF A PHOTOVOLTAIC DEVICE Methods and apparatus are provided for converting electromagnetic radiation, such as solar energy, into electric energy with increased efficiency when compared to conventional solar cells. In one embodiment of a photovoltaic (PV) device, the PV device generally includes... | 05/27/2010 |
| 20090321881 | EPITAXIAL LIFT OFF STACK HAVING A PRE-CURVED HANDLE AND METHODS THEREOF Embodiments of the invention generally relate to epitaxial lift off (ELO) thin films and devices and methods used to form such films and devices. In one embodiment, a method for forming an ELO thin film is provided which includes depositing an epitaxial material over a ... | 12/31/2009 |
| 20090321885 | EPITAXIAL LIFT OFF STACK HAVING A UNIVERSALLY SHRUNK HANDLE AND METHODS THEREOF Embodiments of the invention generally relate to epitaxial lift off (ELO) thin films and devices and methods used to form such films and devices. In one embodiment, a method for forming an ELO thin film is provided which includes depositing an epitaxial material over a ... | 12/31/2009 |
| 20090324379 | METHODS AND APPARATUS FOR A CHEMICAL VAPOR DEPOSITION REACTOR Embodiments of the invention generally relate to a levitating substrate carrier or support. In one embodiment, a substrate carrier for supporting and carrying at least one substrate or wafer is provided which includes a substrate carrier body containing an upper surface... | 12/31/2009 |
| 20090325367 | METHODS AND APPARATUS FOR A CHEMICAL VAPOR DEPOSITION REACTOR Embodiments of the invention generally relate to a chemical vapor deposition system and related method of use. In one embodiment, the system includes a reactor lid assembly having a body, a track assembly having a body and a guide path located along the body, and a heat... | 12/31/2009 |
| 20050260347 | Formation of a silicon oxynitride layer on a high-k dielectric material In one embodiment, a method for depositing a capping layer on a dielectric layer in a process chamber is provided which includes depositing the dielectric layer on a substrate surface, depositing a silicon-containing layer by an ALD process, comprising alternately pulsi... | 11/24/2005 |
