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| Application No. | Application Title | Issue Date |
| 20070229809 | Computer-Implemented Methods and Systems for Determining a Configuration for a Light Scattering Inspection System Computer-implemented methods and systems for determining a configuration for a light scattering inspection system are provided. One computer-implemented method includes determining a three-dimensional map of signal-to-noise ratio values for data that would be acquired f... | 10/04/2007 |
| 20070132987 | Systems and methods for inspecting a wafer with increased sensitivity Systems and methods for inspecting a wafer with increased sensitivity are provided. One system includes an inspection subsystem configured to direct light to a spot on the wafer and to generate output signals responsive to light scattered from the spot on the wafer. The... | 06/14/2007 |
| 20070081151 | Methods and systems for inspection of a wafer Methods and systems for inspection of a wafer are provided. One method includes illuminating the wafer with light at a first wavelength that penetrates into the wafer and light at a second wafer that does not substantially penetrate into the wafer. The method also inclu... | 04/12/2007 |
| 20060197946 | Enhanced simultaneous multi-spot inspection and imaging A system and method for inspection is disclosed. The design includes focusing illumination beams of radiation at an optical axis to an array of illuminated elongated spots on the surface at oblique angle(s) of incidence to the surface, performing a linear scan along a l... | 09/07/2006 |
