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| Application No. | Application Title | Issue Date |
| 20100058842 | SELF-PROPELLED SENSOR APPARATUS FOR IN SITU ANALYSIS OF ENVIROMENTAL PARAMETERS A self-propelled apparatus for analyzing a component contained in a fluid medium. The self-propelled apparatus uses kinetic energy of the apparatus to drive a fluid under analysis through the apparatus. This is accomplished by use of a conveyance system that is attached... | 03/11/2010 |
| 20100058843 | SELF-PROPELLED SENSOR APPARATUS FOR IN SITU ANALYSIS OF ENVIROMENTAL PARAMETERS A submersible, self-propelled apparatus for analyzing a component contained in a liquid medium. The submersible, self-propelled apparatus uses kinetic energy of the apparatus to drive a liquid under analysis through the apparatus. This is accomplished by use of a convey... | 03/11/2010 |
| 20070296946 | Method and apparatus for maskless photolithography A method and apparatus to create two dimensional and three dimensional structures using a maskless photolithography system that is semi-automated, directly reconfigurable, and does not require masks, templates or stencils to create each of the planes or layers on a mult... | 12/27/2007 |
| 20070018652 | Micro sensor system for liquid conductivity, temperature and depth In accordance with the present invention is a miniature planar oceanographic conductivity, temperature pressure (CTD) system based on a thin film material fabricated on a Liquid Crystalline Polymer (LCP). The micro-CTD system in accordance with the present invention ana... | 01/25/2007 |
| 20060256307 | Method and apparatus for maskless photolithography A method and apparatus to create two dimensional and three dimensional structures using a maskless photolithography system that is semi-automated, directly reconfigurable, and does not require masks, templates or stencils to create each of the planes or layers on a mult... | 11/16/2006 |
| 20060192932 | METHOD AND APPARATUS FOR MASKLESS PHOTOLITHOGRAPHY A method and apparatus to create two dimensional and three dimensional structures using a maskless photolithography system that is semi-automated, directly reconfigurable, and does not require masks, templates or stencils to create each of the planes or layers on a mult... | 08/31/2006 |
| 20060121395 | Maskless photolithography for etching and deposition The present invention relates to maskless photolithography using a patterned light generator for creating 2-D and 3-D patterns on objects using etching and deposition techniques. In an embodiment, the patterned light generator uses a micromirror array to direct pattern ... | 06/08/2006 |
| 20060088789 | Maskless photolithography for using photoreactive agents The present invention relates to maskless photolithography using a patterned light generator for creating 2-D and 3-D patterns on objects using photoreactive chemicals. In an embodiment, the patterned light generator uses a micromirror array to direct pattern light on a... | 04/27/2006 |
| 20060055551 | Giant magnetoresistance based gyroscope A gyroscope (10) for determining rate of rotation includes a giant magnetoresistor (GMR) (14) attached to a mass (12) oscillating along a first axis. When the gyroscope (10) is rotated, the mass (12) also oscillates along a second axis... | 03/16/2006 |
