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Inventor: David George Armour


Address: Bolton, GB
No. of patents: 2
Last patent issue date: 01/25/2005

NumberTitleIssue Date
6847043Ion sources for ion implantation apparatus
The invention relates to improving the efficiency of ion flow from an ion source, by reducing heat loss from the source both in the ion chamber of the ion source and its constituent parts (e.g. the electron source). This is achieved by lining the interior of the ion...
01/25/2005
6777882Ion beam generator
G2 electrode is mounted so as to be movable along the beam line and, optionally, perpendicular to it as well. G1 and G2 are curved with a constant gap between G1 and G2 in the radial direction (so that the two electrodes are concen...
08/17/2004
 
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