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| Number | Title | Issue Date |
| 6964898 | Method for fabricating deep trench capacitor A method for fabricating a trench capacitor is disclosed. A substrate is etched to form a first trench recess with a first depth. A spacer layer is deposited on interior surface of the first trench recess. The spacer layer is anisotropic etched back to form a spacer... | 11/15/2005 |
