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Inventor: Chun-Min Cheng


Address: Kaohsiung, TW
No. of applications: 1
Last application issue date: 04/30/2009

Application No.Application TitleIssue Date
20090108331Memory and manufacturing method thereof
A memory having isolated dual memory cells is provided. A first isolation wall and a second isolation wall are separately disposed between a source and a drain on a substrate. An isolation bottom layer and a polysilicon layer are orderly disposed on the substrate betwee...
04/30/2009
 
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