| Patent No. | Patent Title: |
| 5585292 | Method of fabricating a thin film transistor |
| 5540785 | Fabrication of defect free silicon on an insulating substrate |
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| 5518966 | Method for wet etching polysilicon |
| 5506167 | Method of making a high resistance drain junction resistor in a S... |
| 5504042 | Porous dielectric material with improved pore surface properties ... |
| 5504032 | Micromechanical accelerometer and method of manufacture thereof |
| 5502006 | Method for forming electrical contacts in a semiconductor device |
| 5500386 | Manufacturing method of semiconductor devices |
| 5498566 | Isolation region structure of semiconductor device and method for... |
| 5496764 | Process for forming a semiconductor region adjacent to an insulat... |
| 5496765 | Method for manufacturing an insulating trench in a substrate for ... |
| 5494849 | Single-etch stop process for the manufacture of silicon-on-insula... |
| 5494834 | Optoelectronic semiconductor device comprising a waveguide and me... |
| 5492858 | Shallow trench isolation process for high aspect ratio trenches |
| 5492857 | High-frequency wireless communication system on a single ultrathi... |
| 5488012 | Silicon on insulator with active buried regions |
| 5482889 | Method for producing of semiconductor device having of channel st... |
| 5480832 | Method for fabrication of semiconductor device |
| 5478408 | SOI substrate and manufacturing method therefor |
| 5474952 | Process for producing a semiconductor device |
| 5474953 | Method of forming an isolation region comprising a trench isolati... |
| 5472905 | Method for forming a field oxide layer of a semiconductor integra... |
| 5472904 | Thermal trench isolation |
| 5470782 | Method for manufacturing an integrated circuit arrangement |
| 5470780 | Method of fabricating poly-silicon resistor |
| 5468676 | Trench isolation structure and method for forming |
| 5468677 | Isolation structure of semiconductor device and method for formin... |
| 5468686 | Method of cleaning an etching chamber of a dry etching system |
| 5466632 | Field oxide with curvilinear boundaries and method of producing t... |
| 5466303 | Semiconductor device and manufacturing method therefor |
| 5459104 | Process for production of semiconductor substrate |
| 5459107 | Method of obtaining high quality silicon dioxide passivation on s... |
| 5455194 | Encapsulation method for localized oxidation of silicon with tren... |
| 5455193 | Method of forming a silicon-on-insulator (SOI) material having a ... |
| 5455204 | Thin capacitor dielectric by rapid thermal processing |
| 5451547 | Method of manufacturing semiconductor substrate |
| 5449638 | Process on thickness control for silicon-on-insulator technology |
| 5447884 | Shallow trench isolation with thin nitride liner |
| 5447885 | Isolation method of semiconductor device |