| Patent No. | Patent Title: |
| 6000947 | Method of fabricating transistor or other electronic device using... |
| 5950092 | Use of a plasma source to form a layer during the formation of a ... |
| 5893724 | Method for forming a highly reliable and planar ball grid array p... |
| 5872053 | Method of forming an enlarged head on a plug to eliminate the enc... |
| 5858806 | Method of bonding IC component to flat panel display |
| 5851920 | Method of fabrication of metallization system |
| 5849634 | Method of forming silicide film on silicon with oxygen concentrat... |
| 5843835 | Damage free gate dielectric process during gate electrode plasma ... |
| 5843840 | Semiconductor device having a wiring layer and method for manufac... |
| 5840625 | Method of fabricating integrated circuit interconnection employin... |
| 5840622 | Phase mask laser fabrication of fine pattern electronic interconn... |
| 5837603 | Planarization method by use of particle dispersion and subsequent... |
| 5837602 | Method of manufacturing doped interconnect |
| 5834369 | Method of preventing diffusion between interconnect and plug |
| 5830801 | Resistless methods of gate formation in MOS devices |
| 5827775 | Phase mask laser fabrication of fine pattern electronic interconn... |
| 5824568 | Process of making an integrated circuit chip composite |
| 5824597 | Method of forming contact hole plug |
| 5817576 | Utilization of SiH4 soak and purge in deposition proce... |
| 5811352 | Method of making reliable metal leads in high speed LSI semicondu... |
| 5811319 | Methods of forming electrodes on gallium nitride group compound ... |
| 5811316 | Method of forming teos oxide and silicon nitride passivation laye... |
| 5804475 | Method of forming an interband lateral resonant tunneling transis... |
| 5804501 | Method for forming a wiring metal layer in a semiconductor device |
| 5801086 | Process for formation of contact conductive layer in a semiconduc... |
| 5798296 | Method of fabricating a gate having a barrier of titanium silicid... |
| 5798300 | Method for forming conductors in integrated circuits |
| 5797971 | Method of making composite electrode materials for high energy an... |
| 5795817 | MOS transistor adopting titanium-carbon-nitride gate electrode an... |
| 5795796 | Method of fabricating metal line structure |
| 5792708 | Method for forming residue free patterned polysilicon layers upon... |
| 5792703 | Self-aligned contact wiring process for SI devices |
| 5789271 | Method for fabricating microbump interconnect for bare semiconduc... |
| 5780357 | Deposition process for coating or filling re-entry shaped contact... |
| 5780360 | Purge in silicide deposition processes dichlorosilane |
| 5776822 | Method for fabricating semiconductor device having titanium silic... |
| 5776823 | Tasin oxygen diffusion barrier in multilayer structures |
| 5773316 | Method and device for measuring physical quantity, method for ... |
| 5773357 | Method for producing silicon film to bury contact hole |
| 5769907 | Method for producing aluminum electrolytic capacitor |
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