U.S. patents available from 1976 to present.
U.S. patent applications available from 2005 to present.

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Examiner: MacArthur, Sylvia R.


Primary examiner statistics: 119 patents; average approval time: 133 days
Assistant examiner statistics: 245 patents; average approval time: 905 days

Patents as Primary Examiner (view all)

Patent No. Patent Title:
8187415 Plasma etch reactor with distribution of etch gases across a wafe...
8172950 Substrate processing apparatus and semiconductor device producing...
8157952 Plasma processing chamber, potential controlling apparatus, poten...
8156892 Edge profiling for process chamber shields
8157915 CVD reactor having a process-chamber ceiling which can be lowered
8128752 Roll-to-roll substrate transfer apparatus, wet etching apparatus ...
8123900 Substrate supporting unit and apparatus for treating substrate us...
8123901 Etching apparatus
8114247 Plasma processing apparatus and focus ring
8110044 Substrate processing apparatus and temperature control device
8102014 Proximity head heating method and apparatus
8092602 Thermally zoned substrate holder assembly
8075731 Substrate processing apparatus and a substrate processing method
8075729 Method and apparatus for controlling temperature of a substrate
8070909 Feedback control of chemical mechanical polishing device providin...
8062471 Proximity head heating method and apparatus
8057599 Substrate processing apparatus and method for manufacturing a sem...
8057634 Method and apparatus for plasma processing
8052833 Chemical treatment apparatus
8052834 Substrate treating system, substrate treating device, program, an...
8051556 Method of manufacturing apparatus for spatial and temporal contro...
8043467 Liquid processing apparatus and liquid processing method
8043433 High efficiency electro-static chucks for semiconductor wafer pro...
8043469 Substrate processing method, substrate processing apparatus, and ...
8043431 Substrate processing apparatus and method for manufacturing a sem...
8043468 Apparatus for and method of processing substrate
8043521 Processing apparatus
8038838 Spin head, method of operating the spin head and apparatus for tr...
8038796 Apparatus for spatial and temporal control of temperature on a su...
8029641 Device and method for liquid treatment of wafer-shaped articles
8025732 Apparatus for processing a substrate
8025759 Polishing apparatus and polishing method
8021512 Method of preventing premature drying
8016976 Film removing device and film removing method
8007634 Wafer spin chuck and an etcher using the same
8007631 System and method for imprint lithography to facilitate dual dama...
7998308 Liquid processing apparatus
7998306 Substrate processing apparatus
7993461 Method and system for mask handling in high productivity chamber
7993485 Methods and apparatus for processing a substrate

Patents as Assistant Examiner (view all)

Patent No. Patent Title:
7250084 Downward mechanism for support pins
7235154 Devices and methods for optical endpoint detection during semicon...
7235139 Wafer carrier for growing GaN wafers
7229521 Etching system using a deionized water adding device
7186297 Wafer holding apparatus
7175714 Electrode-built-in susceptor and a manufacturing method therefor
7166184 Multi-stage type processing apparatus
7166183 Apparatus and method for treating edge of substrate
7160416 Substrate treating apparatus
7160493 Retaining ring for use on a carrier of a polishing apparatus
7160392 Method for dechucking a substrate
7156947 Energy enhanced surface planarization
7156948 Wet etching apparatus
7150792 Film deposition system and film deposition method using the same
7147720 Non-contact cool-down station for wafers
7105074 Substrate treating method and apparatus
7083700 Methods and apparatuses for planarizing microelectronic substrate...
7081182 Method and apparatus for automatically measuring the concentratio...
7081166 Planetary system workpiece support and method for surface treatme...
7052577 Annular receptacle for a rotating carrier
7037403 In-situ real-time monitoring technique and apparatus for detectio...
7024063 In-situ real-time monitoring technique and apparatus for endpoint...
6998013 CMP apparatus polishing head with concentric pressure zones
6975109 Method for forming a magnetic sensor that uses a Lorentz force an...
6957749 Liquid delivery system
6953515 Apparatus and method for providing a signal port in a polishing p...
6951624 Method and apparatus of arrayed sensors for metrological control
6951597 Dynamic polishing fluid delivery system for a rotational polishin...
6949143 Dual substrate loadlock process equipment
6932885 Vacuum processing device
6926774 Piezoelectric vaporizer
6921466 Revolution member supporting apparatus and semiconductor substrat...
6918988 Semiconductor processing device
6918989 Apparatus for manufacturing printed wiring board and method for m...
6917508 Apparatus for manufacturing semiconductor device
6913669 Retaining ring for holding semiconductor wafers in a chemical mec...
6911111 Inline monitoring of pad loading for CuCMP and developing an endp...
6905570 Apparatus for manufacturing integrated circuit device
6905571 Wafer polishing method and wafer polishing apparatus in semicondu...
6899784 Apparatus for detecting CMP endpoint in acidic slurries
 
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