| Patent No. | Patent Title: |
| 8029962 | Developing agent |
| 8007969 | Tri-level xerography for hypochromatic colorants |
| 8003303 | Intensity selective exposure method and apparatus |
| 8003281 | Hybrid multi-layer mask |
| 7999910 | System and method for manufacturing a mask for semiconductor proc... |
| 7993803 | Method for fabricating chromeless phase shift mask |
| 7993802 | Method for correcting pattern critical dimension in photomask |
| 7985521 | Anthracene containing photoconductors |
| 7972442 | Photoplate for OLED deposition screen |
| 7968263 | Amine phosphate containing photogenerating layer photoconductors |
| 7968255 | Photomask |
| 7960074 | Method of generating a photolithography patterning device, comput... |
| 7960078 | Exposure condition setting method, substrate processing device, a... |
| 7960075 | Photomask unit, exposing method and method for manufacturing semi... |
| 7960080 | Oxadiazole containing photoconductors |
| 7951514 | Polymer anticurl backside coating (ACBC) photoconductors |
| 7951513 | Pellicle and method for producing pellicle |
| 7947412 | Reduced lens heating methods, apparatus, and systems |
| 7943274 | Mask pattern correction and layout method |
| 7943273 | Photomask with detector for optimizing an integrated circuit prod... |
| 7939229 | Photomask, semiconductor device, and method for manufacturing sem... |
| 7939226 | Binary mask, method for fabricating the binary mask, and method f... |
| 7935460 | Mask blank for EUV exposure and mask for EUV exposure |
| 7935459 | Photo-masks and methods of fabricating surface-relief grating dif... |
| 7932003 | Methods of forming and using reticles |
| 7932001 | Method of fabricating halftone phase shift mask |
| 7927782 | Simplified double mask patterning system |
| 7927763 | Pellicle for photolithography and pellicle frame |
| 7923181 | Methods of forming photomasks |
| 7923179 | Exposure mask and pattern forming method therefor |
| 7919231 | Photolithographic method and mask devices utilized for multiple e... |
| 7919217 | Pellicle and method for producing pellicle |
| 7910268 | Method for fabricating fine pattern in photomask |
| 7910269 | Photomask with detector for optimizing an integrated circuit prod... |
| 7910270 | Reticle constructions |
| 7910266 | Pattern forming method and mask |
| 7910267 | Method and system for providing optical proximity correction for ... |
| 7906255 | Photo-masks and methods of fabricating periodic optical structure... |
| 7901848 | Method of fabricating a photomask using self assembly molecule |
| 7901872 | Exposure process and photomask set used therein |
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