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| Number | Title | Issue Date |
| 8128755 | Cleaning solvent and cleaning method for metallic compound Disclosed are cleaning solvents and cleaning methods for metallic compounds deposited on the equipment that supplies organometallic compounds to the manufacturing tool in the photovoltaic industry or the semiconductor industry. The cleaning solvents and the cleaning... | 03/06/2012 |
| 8083861 | Apparatus and method for cleaning pipelines, tubing and membranes using two-phase flow An apparatus and method for cleaning passageways and the like with a two-phase mixture of gas under pressure and an aqueous cleaning solution. The two-phase cleaning mixture is generated in a module and is passed out of the module at a predetermined rate that determ... | 12/27/2011 |
| 8025737 | Substrate cleaning apparatus and method employed therein A substrate cleaning apparatus for cleaning a front-side clean target surface 1a and a back-side clean target surface 1b of a edge portion of a substrate 1 by wiping surfaces 12a, 12b of a cleaning tape 12. The substrate cle... | 09/27/2011 |
| 8021490 | Substrate cleaning processes through the use of solvents and systems A method for removing common contaminates or residues which include but are not limited to ionic residues, particulate residues and moisture from semiconductor wafers used in the manufacture of IC (integrated circuits), liquid crystal displays and flat panel display... | 09/20/2011 |
| 8016949 | Process and a device to clean substrates In particular a porous substrate (FS) like a fabric. Process to clean a substrate, comprising a step of subjecting the substrate to an air-water spray (SPR), generated using a spraying means (N) comprising an air passage (OPA) and a water passage (OPW), wherein air ... | 09/13/2011 |
| 8007594 | Method for manufacturing semiconductor device A method for manufacturing a semiconductor device includes the step of conducting a cleaning process for a wafer formed with copper wiring lines to remove contaminations produced on a back surface of the wafer. The cleaning process is conducted by injecting onto the... | 08/30/2011 |
| 8007593 | Remover compositions A remover composition containing 1,3-propanediamine (a), 1-hydroxyethylidene-1, 1-diphosphonic acid (b) and water, wherein the remover composition contains the component (a) in an amount of from 0.2 to 30% by weight, the component (b) in an amount of from 0.05 to 10... | 08/30/2011 |
| 7998275 | Method for cleaning a circumferential surface of a cylinder of a printing press A method for cleaning a circumferential surface of a cylinder of a printing press provides for improved cleaning to be achieved during a short time. In order to clean the circumferential surface, a cleaning fluid is first applied to the circumferential surface. In o... | 08/16/2011 |
| 7993467 | Apparatus for removing matte-sticking and method for using the apparatus An apparatus and method are provided to remove matte-sticking adhered to an inner surface of an inclined rear jacket of an exhaust gas hood for collecting exhaust gas discharged during the converter operation in copper smelting. Scraping means 10a˜... | 08/09/2011 |
| 7976640 | On-line heat exchanger cleaning method A method for the on-line cleaning of a heat exchanger used with petroleum process fluids which create coke deposits of asphaltenic origin on the exchanger tubes. The asphaltenes are removed by re-dissolution in a solvent oil of high solubility power for the asphalte... | 07/12/2011 |
| 7967913 | Remote plasma clean process with cycled high and low pressure clean steps A remote plasma process for removing unwanted deposition build-up from one or more interior surfaces of a substrate processing chamber after processing a substrate disposed in the substrate processing chamber. In one embodiment, the substrate is transferred out of t... | 06/28/2011 |
| 7964042 | Substrate processing apparatus and substrate processing method After the rinsing processing is completed, the rotation speed of the substrate is reduced from 600 rpm to 10 rpm to form a puddle-like DIW liquid film. After the supply of DIW is stopped, the control unit waits for a predetermined time (0.5 seconds) so that the film... | 06/21/2011 |
| 7964040 | Multi-port pumping system for substrate processing chambers An exhaust foreline for purging fluids from a semiconductor fabrication chamber is described. The foreline may include a first, second and third ports independently coupled to the chamber. A semiconductor fabrication system is also described that includes a substrat... | 06/21/2011 |
| 7955440 | Method for cleaning silicon wafer and apparatus for cleaning the silicon wafer After a water film is formed on a wafer front surface in a chamber, the water film is supplied sequentially with an oxidizing component of an oxidation gas, an organic acid component of an organic acid mist, an HF component of an HF gas, the organic acid mist, and t... | 06/07/2011 |
| 7947130 | Troika acid semiconductor cleaning compositions and methods of use Semiconductor processing compositions for use with silicon wafers having an insulating layers and metallization layers on the wafers comprising water and one or more Troika acids which is also referred to as α,α-disubstituted trifunctional oximes or α-(Hydroxyimi... | 05/24/2011 |
| 7947129 | Ion source apparatus and cleaning optimized method thereof An ion source apparatus includes a rare gas supply source supplying rare gas instead of ion source gas to a plasma chamber, means to determine time and timing for cleaning electrodes in consideration of a collecting amount of insulation layers accreting to the elect... | 05/24/2011 |
| 7942980 | Starch removal process Starch is removed from the surface of an article using a multi-step method that includes presoaking the article in an acidic solution to remove the starch from the surface of the article and washing the article in an alkaline solution to clean the article. ... | 05/17/2011 |
| 7938912 | Composition for removing cementitious material from a surface and associated methods A composition is provided for use in cleaning a surface of a cementitious material. The composition includes HCl, urea, complex substituted keto-amine-hydrochloride, an alcohol, an ethoxylate, and a ketone. A method of using the composition includes applying the com... | 05/10/2011 |
| 7931753 | Method for removing deposits containing magnetite and copper from containers in industrial and power plants A method to remove deposits containing magnetite and copper from a container, particularly from a steam generator of a nuclear power plant. In a first step, the container is treated using an alkaline cleaning solution containing a complexing agent forming a soluble ... | 04/26/2011 |
| 7922828 | Cleaning compositions containing water soluble magnesium compounds and methods of using them The present invention relates to cleaning compositions and methods employing a water soluble magnesium compound. Such compositions can be used for reducing scale, rinsing, hard surface cleaning, ware washing, and corrosion inhibition. ... | 04/12/2011 |
| RE42248 | Cleaning method, cleaning apparatus and electro optical device A cleaning apparatus of organic substances attached to a vapor-deposition mask for low molecular weight organic EL devices comprises a first stage for treating a vapor-deposition mask with a derivative of pyrrolidone, a second stage for rinsing the vapor-deposition ... | 03/29/2011 |
| 7909935 | Method for cleaning a fluid delivery system The present invention is directed to a method of cleaning an interior surface of a fluid delivery system. The method comprises introducing a first liquid into the fluid delivery system and contacting the interior surface with the first liquid; forming a slurry by in... | 03/22/2011 |
| 7905963 | Apparatus and method for washing polycrystalline silicon Disclosed is a polycrystalline silicon washing apparatus that sequentially immerses polycrystalline silicon into a plurality of acid baths each of which is filled with an acid to wash the polycrystalline silicon. The temperatures of the acids in the acid baths are s... | 03/15/2011 |
| 7901515 | Media path universal cleaning fluid composition Exemplary embodiments provide a cleaning composition that can include alkane components for cleaning printer members made of elastomeric materials. ... | 03/08/2011 |
| 7901514 | Substrate cleaning method and developing apparatus A cleaning method of cleaning a surface of a substrate that is processed by a developing process. The method includes pouring a cleaning liquid onto a central part of the substrate. A dry area that is not wetted with the cleaning liquid is created in a central part ... | 03/08/2011 |
| 7892359 | Dishwasher in the form of a programmable machine and its operating method A dishwasher in the form of a programmable machine, in particular a commercial dishwasher, having a pre-cleaning station, which is disposed outside a treatment chamber of the dishwasher, and having a waste water transfer system, by which washing liquid can be fed fr... | 02/22/2011 |
| 7887638 | Removal of niobium second phase particle deposits from pickled zirconium-niobium alloys The present invention relates generally to a process and chemical composition for the removal of adherent niobium-rich second-phase particles (SPPs) from pickled niobium-containing zirconium alloys which includes applying to the alloy surface a chemical composition ... | 02/15/2011 |
| 7879153 | Method for cleaning metal nanoparticles It relates to a method for removing a surfactant, organic materials and chlorine ions remained on the surface of metal nanoparticles, prepared on an organic solvent phase including a surfactant. The method for cleaning metal nanoparticles herein is efficient to remo... | 02/01/2011 |
| 7879155 | Process for removal of paint from plastic substrates A method of removing paint from a plastic substrate at least partially coated with a paint coating by: providing at least one plastic substrate at least partially coated with a paint coating; providing a kit for a user to utilize to remove paint from the plastic sub... | 02/01/2011 |
| 7867336 | Cleaning wastewater holding tanks Vibrators, each comprising an electric motor having an eccentric weight on its rotating shaft, are adhesively secured to the bottoms of the wastewater holding tanks of a recreational vehicle, to aid in flushing the tanks by dislodging solid debris from the inside wa... | 01/11/2011 |
| 7857913 | Cleaning compound for cleaning surfaces in a food processing environment A cleaning compound for cleaning surfaces in a food processing environment includes at least one container, with each container including a peroxide and/or an alkaline reactant therein. The alkaline reactant is selected to raise the pH of the cleaning compound into ... | 12/28/2010 |
| 7846257 | Method for cleaning substrate processing apparatus, substrate processing apparatus, program and recording medium having program recorded therein The substrate processing apparatus includes a plurality of processing chambers. A given processing chamber is cleaned by first executing first processing during which voltage application control is executed to control a voltage applied to an electrostatic chuck base... | 12/07/2010 |
| 7846261 | Methods of using halogen-containing organic compounds to remove deposits from internal surfaces of turbine engine components Methods for cleaning surface deposits, such as sulfidation deposits or dust particles, from a surface bounding an internal passage in a turbine engine component. The surface deposits are cleaned by placing a halogen-containing organic compound, such as a fluorine-co... | 12/07/2010 |
| 7846265 | Media path universal cleaning fluid composition Exemplary embodiments provide a cleaning composition that can include alkane components for cleaning printer members made of elastomeric materials. ... | 12/07/2010 |
| 7837804 | Substrate cleaning method, substrate cleaning equipment, computer program, and program recording medium In a dry process after a cleaning process using a cleaning-liquid nozzle and a rinse process using a side rinse nozzle are performed on a wafer W, the wafer W is turned, feeding of pure water to a center point of the wafer W from a pure-water nozzle is started, and ... | 11/23/2010 |
| 7828905 | Cleaning compositions containing water soluble magnesium compounds and methods of using them The present invention relates to cleaning compositions and methods employing a water soluble magnesium compound. Such compositions can be used for reducing scale, rinsing, hard surface cleaning, ware washing, and corrosion inhibition. ... | 11/09/2010 |
| 7828907 | Detergent component for preventing precipitation of water hardness and providing soil removal properties A cleaning composition for removing soils includes an alkyl vinyl ether-maleic acid copolymer and at least one component selected from the group consisting of sodium carbonate and sodium hydroxide. The composition contains less than about 10% by weight of at least o... | 11/09/2010 |
| 7828908 | Acid cleaning and corrosion inhibiting compositions comprising gluconic acid A biodegradable acid cleaning composition for cleaning stainless steel, and other surfaces is disclosed. The composition comprises urea sulfate in combination with gluconic acid which serves as a corrosion inhibitor. The composition retains the cleaning and corrosio... | 11/09/2010 |
| 7803230 | Substrate cleaning apparatus, substrate cleaning method, and medium for recording program used for the method In a substrate cleaning method and a substrate cleaning method according to the present invention, a brush 3 is brought into contact with a substrate W while rotating the same, and a cleaning position Sb of the brush 3 is moved relative to the substrat... | 09/28/2010 |
| 7799140 | Process for the removal of photoreceptor coatings using a stripping solution The disclosed embodiments are directed to processes for removing photoreceptor coatings from a substrate, wherein the photoreceptor coatings disposed over a substrate of an electrophotographic photoreceptor. More specifically, the invention discloses a photoreceptor... | 09/21/2010 |
