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Examiner: Mohamedulla, Saleha R.


Primary examiner statistics: 70 patents; average approval time: 1011 days
Assistant examiner statistics: 245 patents; average approval time: 992 days

Patents as Primary Examiner (view all)

Patent No. Patent Title:
7125639 Molecular transfer lithography
7122281 Critical dimension control using full phase and trim masks
7049033 EUV lithography reticles fabricated without the use of a patterne...
7029800 Reticle with antistatic coating
7018746 Method of verifying the placement of sub-resolution assist featur...
7014963 Non absorbing reticle and method of making same
7011909 Photolithography mask and method of fabricating a photolithograph...
7011936 Photomask and method of structuring a photoresist by double expos...
7011926 Gap forming pattern fracturing method for forming optical proximi...
7008730 Application of high transmittance attenuating phase shifting mask...
7008731 Method of manufacturing a photomask and method of manufacturing a...
7008729 Method for fabricating phase mask of photolithography process
7008738 Microlithographic structures and method of fabrication
7005216 Photo mask
7005215 Mask repair using multiple exposures
7001695 Multiple alternating phase shift technology for amplifying resolu...
7001693 Binary OPC for assist feature layout optimization
7001692 Method of forming a mask having nitride film
6998203 Proximity correcting lithography mask blanks
6984474 Reticle barrier system for extreme ultra-violet lithography
6979520 Stencil mask for ion implantation
6974650 Method of correcting a mask layout
6958201 Electron beam exposure mask, electron beam exposure method, metho...
6924068 Photomask fabrication method, photomask, and exposure method ther...
6866970 Apparatus and method to improve the resolution of photolithograph...
6861180 Contact printing as second exposure of double exposure attenuated...
6858357 Attenuated embedded phase shift photomask blanks
6858356 Method of generating large scale signal paths in a parallel proce...
6858353 Increased-contrast film for high-transmittance attenuated phase-s...
6849393 Phase shifting lithographic process
6849363 Method for repairing a photomask, method for inspecting a photoma...
6846597 Photomask inspecting method
6844117 Dry-etching method and apparatus, photomasks and method for the p...
6844123 System for production of large area display panels with improved ...
6844118 Method and layout for high density reticle
6844116 Transfer sheet for transferring protective layer for photographic...
6841313 Photomask with dies relating to different functionalities
6841337 Masking apparatus and method
6841323 Mask producing method
6841316 Method for producing a phase shift mask

Patents as Assistant Examiner (view all)

Patent No. Patent Title:
7083879 Phase conflict resolution for photolithographic masks
7026081 Optical proximity correction method utilizing phase-edges as sub-...
6924071 Photomask and method for reducing exposure times of high density ...
6924083 Mask layout and exposing method for reducing diffraction effects ...
6921613 Electrostatic pellicle system for a mask
6919148 Member for a mask film, process for producing a mask film using t...
6919150 Structures useful in electron beam lithography
6913857 Exposure mask, method for manufacturing the mask, and exposure me...
6913859 Mask for differential curing and process for making same
6911283 Method and apparatus for coupling a pellicle to a photomask using...
6911301 Methods of forming aligned structures with radiation-sensitive ma...
6908716 Disposable hard mask for photomask plasma etching
6893786 Field correction of overlay error
6887625 Assist features for use in lithographic projection
6884549 Method for photographic recording of at least a linear and/or non...
6869733 Pellicle with anti-static/dissipative material coating to prevent...
6869751 Method of manufacturing metal electrode
6869738 Mask pattern correction method
6866971 Full phase shifting mask in damascene process
6861182 Tri-tone attenuated phase shift trim mask for double exposure alt...
6861179 Charge effect and electrostatic damage prevention method on photo...
6858352 Printed circuit fabrication
6855485 Pattern forming method and apparatus for fabricating semiconducto...
6835505 Mask for projection photolithography at or below about 160 nm and...
6794095 Method of fabricating a microstructure and photolithography trimm...
6787270 Photo mask for patterning a lightning rod
6780568 Phase-shift photomask for patterning high density features
6777167 Method of producing an etch-resistant polymer structure using ele...
6773871 Method of machining glass
6773854 Method of producing a perforated mask for particle radiation
6770403 Mask for a photolithography process and method of fabricating the...
6767675 Mask and method of manufacturing the same
6762000 Phase shift mask blank, photo mask blank and manufacturing appara...
6762001 Method of fabricating an exposure mask for semiconductor manufact...
6756164 Exposure mask with repaired dummy structure and method of repairi...
6756158 Thermal generation of mask pattern
6753131 Transparent elastomeric, contact-mode photolithography mask, sens...
6749974 Disposable hard mask for photomask plasma etching
6749968 Method for fabricating a thin-membrane stencil mask and method fo...
6746805 Methods for fabricating lithography apparatus
 
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