U.S. patents available from 1976 to present.
U.S. patent applications available from 2005 to present.

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Examiner: Zervigon, Rudy


Primary examiner statistics: 189 patents; average approval time: 196 days
Assistant examiner statistics: 159 patents; average approval time: 971 days

Patents as Primary Examiner (view all)

Patent No. Patent Title:
8176871 Substrate processing apparatus
8161906 Clamped showerhead electrode assembly
8163088 Method of densifying thin porous substrates by chemical vapor inf...
8152925 Baffle plate and substrate processing apparatus
8152922 Gas mixer and manifold assembly for ALD reactor
8152924 CVD reactor comprising a gas inlet member
8142567 Vacuum processing apparatus
8136479 Plasma treatment apparatus and plasma treatment method
8137463 Dual zone gas injection nozzle
8137467 Temperature controlled showerhead
8137465 Single-chamber sequential curing of semiconductor wafers
8133323 Film forming apparatus and method, gas supply device and storage ...
8133322 Apparatus for inverted multi-wafer MOCVD fabrication
8128751 Film-forming apparatus
8123860 Apparatus for cyclical depositing of thin films
8118938 Lower liner with integrated flow equalizer and improved conductan...
8114245 Plasma etching device
8100081 Edge removal of films using externally generated plasma species
8101235 Vaporization apparatus with precise powder metering
8097120 Process tuning gas injection from the substrate edge
8092640 Plasma processing apparatus and semiconductor device manufactured...
8087379 Localized plasma processing
8088223 System for control of gas injectors
8082877 Heating device coating plant and method for evaporation or sublim...
8083889 Apparatus and method for plasma etching
8082878 Thermal evaporation apparatus, use and method of depositing a mat...
8075789 Remote plasma cleaning source having reduced reactivity with a su...
8075692 Fluid bed reactor
8075728 Gas flow equalizer plate suitable for use in a substrate process ...
8074599 Plasma uniformity control by gas diffuser curvature
8075690 Diffuser gravity support
8069817 Showerhead electrodes and showerhead electrode assemblies having ...
8070879 Apparatus and method for hybrid chemical processing
8070880 Substrate processing apparatus
8062427 Particulate material metering and vaporization
8061299 Formation of photoconductive and photovoltaic films
8056503 Plasma procesor and plasma processing method
8057633 Post-etch treatment system for removing residue on a substrate
8047158 Substrate processing apparatus and reaction container
8048230 Metering and vaporizing particulate material

Patents as Assistant Examiner (view all)

Patent No. Patent Title:
6857387 Multiple frequency plasma chamber with grounding capacitor at cat...
6830619 Method and apparatus for controlling a temperature of a microelec...
6808747 Coating boron carbide on aluminum
6779481 Electrical coupling between chamber parts in electronic device pr...
6772827 Suspended gas distribution manifold for plasma chamber
6770145 Low-pressure CVD apparatus and method of manufacturing a thin fil...
6746565 Semiconductor processor with wafer face protection
6709522 Material handling system and methods for a multichamber plasma tr...
6705245 Apparatus for forming polymer continuously on the surface of meta...
6694915 Plasma reactor having a symmetrical parallel conductor coil anten...
6692575 Apparatus for supporting a substrate in a reaction chamber
6682628 Methods and apparatuses for monitoring and controlling mechanical...
6656846 Apparatus for processing samples
6638880 Chemical vapor deposition apparatus and a method of manufacturing...
6632325 Article for use in a semiconductor processing chamber and method ...
6623596 Plasma reactor having an inductive antenna coupling power through...
6620249 Method and apparatus for depositing thin layers
6605176 Aperture for linear control of vacuum chamber pressure
6602116 Substrate retaining ring
6592673 Apparatus and method for detecting a presence or position of a su...
6585851 Plasma etching device
6583064 Low contamination high density plasma etch chambers and methods f...
6568346 Distributed inductively-coupled plasma source and circuit for cou...
6554954 Conductive collar surrounding semiconductor workpiece in plasma c...
6543380 Device for the production of homogenous microwave plasma
6539890 Multiple source deposition plasma apparatus
6537422 Single-substrate-heat-processing apparatus for semiconductor proc...
6537418 Spatially uniform gas supply and pump configuration for large waf...
6537417 Apparatus for processing samples
6537415 Apparatus for processing samples
6531029 Vacuum plasma processor apparatus and method
6531030 Inductively coupled plasma etching apparatus
6523493 Ring-shaped high-density plasma source and method
6513451 Controlling the thickness of an organic layer in an organic light...
6511577 Reduced impedance chamber
6508885 Edge sealing structure for substrate in low-pressure processing e...
6508198 Automatic tuning in a tapped RF transformer inductive source of a...
6508199 Plasma processing apparatus
6506253 Photo-excited gas processing apparatus for semiconductor process
6506691 High rate silicon nitride deposition method at low pressures
 
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