U.S. patents available from 1976 to present.
U.S. patent applications available from 2005 to present.

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...that a workman who left the soap mixing machine on too long was responsible for making Ivory Soap? He was so embarrassed by his mistake that he threw the mess in a stream. Imagine his dismay when the evidence of his error floated to the surface! Result: Ivory soap, the soap that floats.

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Examiner: Ashton, Rosemary


Primary examiner statistics: 401 patents; average approval time: 853 days
Assistant examiner statistics: 382 patents; average approval time: 746 days

Patents as Primary Examiner (view all)

Patent No. Patent Title:
7267924 Top anti-reflective coating polymer, its preparation method and t...
7261997 Spin bowl compatible polyamic acids/imides as wet developable pol...
7258962 Positive-tone radiation-sensitive resin composition
7252925 Nitrogen-containing organic compound, resist composition and patt...
7247419 Nanocomposite photosensitive composition and use thereof
7244542 Resins and photoresist compositions comprising same
7226721 Underlayer coating forming composition for lithography containing...
7208261 Polymers, processes for polymer synthesis and photoresist composi...
7205090 Chemical amplification type positive resist composition
7202016 Radiation-sensitive resin composition
7202015 Positive photoresist composition and pattern making method using ...
7186495 (Meth) acrylate derivative, polymer and photoresist composition h...
7183037 Antireflective coatings with increased etch rates
7179580 Radiation sensitive material and method for forming pattern
7169532 Chemically amplified positive photoresist composition for thick f...
7157208 Positive resist composition and pattern forming method using the ...
7148265 Functional polymer
7144675 Radiation-sensitive resin composition
7138217 Positive resist composition
7125642 Sulfonates, polymers, resist compositions and patterning process
7125641 Polymers, resist compositions and patterning process
7115690 Fluorine-containing polymer, resist composition prepared from sam...
7112397 Image forming composition and photosensitive lithographic plate u...
7108952 Photopolymerizable composition
7084227 Photosensitive polymer and chemically amplified photoresist compo...
7078444 Ionic photoacid generators with segmented hydrocarbonfluorocarbon...
7060775 Polymer compound, resist material and pattern formation method
7052826 Monitoring method, process and system for photoresist regeneratio...
7033735 Water soluble negative tone photoresist
7033732 Method of preparing anti-reflective coating polymer and anti-refl...
7029825 Photosensitive resin compositive for printing plate precursor cap...
7022459 Photosensitive composition
7022458 Photoresist polymer and photoresist composition containing the sa...
7022454 Monomers, polymers, methods of synthesis thereof and photoresist ...
7018714 Near-infrared absorption film
7008752 Photosensitive resin composition and use of the same
7001707 Resist compositions and patterning process
6991888 Photoresist composition for deep ultraviolet lithography comprisi...
6962769 Anti-reflective coating composition with improved spin bowl compa...
6946233 Polymer, resist material and patterning method

Patents as Assistant Examiner (view all)

Patent No. Patent Title:
6309789 Composition for reflection reducing coating
6294309 Positive photoresist composition containing alicyclic dissolution...
6284428 Undercoating composition for photolithographic resist
6280898 Lactone-containing compounds, polymers, resist compositions, and ...
6268106 Chemically amplified positive photoresist composition
6265133 Radiation curable resin composition
6245483 Photosensitive resin composition
6245930 Chemical-sensitization resist composition
6235447 Photoresist monomers, polymers thereof, and photoresist compositi...
6225019 Photosensitive resin, resist based on the photosensitive resin, e...
6225021 Photopolymerizable composition based on polyiso(thio)cyanate mono...
6218076 Stabilizer for organic borate salts and photosensitive compositio...
6210863 Borate coinitiators for photopolymerization
6210858 Anti-reflection film and display device using the same
6203965 Photoresist comprising blends of photoacid generators
6200729 Positive photosensitive composition
6200728 Photoresist compositions comprising blends of photoacid generator...
6187504 Radiation sensitive resin composition
6187505 Radiation sensitive silicon-containing resists
6183935 Inorganic-containing photosensitive resin composition and method ...
6183942 Thinner composition for removing spin-on-glass and photoresist
6180323 Photopolymerizable compositions having improved sidewall geometry...
6174644 Anti-reflective silicon nitride film using in-situ deposition
6174642 Imaging system employing encapsulated radiation sensitive composi...
6171757 Organometallic polymers and use thereof
6171756 Photoactive materials applicable to imaging systems
6171754 Chemically amplified resist compositions
6171755 Chemically amplified resist
6168899 Multiple color proof temporary supports, photopolymerizable mater...
6165680 Dissolution inhibitor of chemically amplified photoresist and che...
6165652 Pattern forming method and pattern forming apparatus
6165682 Radiation sensitive copolymers, photoresist compositions thereof ...
6165677 Photoresist composition
6165686 Photocurable composition and color reversion preventing method
6162577 Method for extreme ultraviolet lithography
6156478 Photocurable and photopatternable hydrogel matrix based on azlact...
6156481 Positive resist composition
6156480 Low defect thin resist processing for deep submicron lithography
6156479 Thermosetting anti-refective coatings
6153354 Electron beam negative working resist composition
 
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