| Patent No. | Patent Title: |
| 7081325 | Photoresist polymer and photoresist composition including the sam... |
| 7033727 | Photosensitive composition and acid generator |
| 6916598 | Ionization radiation imageable photopolymer compositions |
| 6902875 | Photosensitive polysilazane composition, method of forming patter... |
| 6899994 | On-press developable IR sensitive printing plates using binder re... |
| 6890697 | Positive-working chemical-amplification photoresist composition |
| 6869745 | Positive-working chemical-amplification photoresist composition |
| 6855480 | Photoresist composition |
| 6849382 | Photosensitive polymer containing silicon and a resist compositio... |
| 6849377 | Photoresists, polymers and processes for microlithography |
| 6844136 | Photopolymerizable mixture and recording material prepared therew... |
| 6844135 | Chemically amplified resist material and patterning method using ... |
| 6838224 | Chemical amplification, positive resist compositions |
| 6835528 | Fluorine-containing photoresist having reactive anchors for chemi... |
| 6835804 | Preparation of polymer, and resist composition using the polymer |
| 6835530 | Base material for lithography |
| 6835525 | Polymer, resist composition and patterning process |
| 6828083 | Photoresist compositions and use of same |
| 6818375 | Photoresist composition |
| 6815145 | Resist materials for 157-nm lithography |
| 6815144 | Positive-working chemical-amplification photoresist composition |
| 6806040 | Photosensitive composition for manufacturing optical waveguide, p... |
| 6803171 | Photoimageable composition |
| 6800420 | Photosensitive thick film composition |
| 6800415 | Negative-acting aqueous photoresist composition |
| 6797452 | Photosensitive composition comprising photosensitive saponified p... |
| 6790596 | Photoreactive resin composition and method of manufacturing circu... |
| 6787289 | Radiation sensitive refractive index changing composition and ref... |
| 6787290 | Positive-working photoresist composition and resist patterning me... |
| 6787284 | Positive resist composition and base material carrying layer of t... |
| 6777164 | Lithographic printing forms |
| 6777161 | Lower layer resist composition for silicon-containing two-layer r... |
| 6773872 | Reduction of inorganic contaminants in polymers and photoresist c... |
| 6773863 | Positive-working chemical-amplification photoresist composition |
| 6773862 | Negative resist composition |
| 6770413 | Hydroxyphenyl copolymers and photoresists comprising same |
| 6770418 | Positive resist compositions containing non-polymeric silicon |
| 6770419 | Low silicon-outgassing resist for bilayer lithography |
| 6767688 | Photoresist compositions |
| 6764807 | Planographic printing |
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