Famous Patents
In 1879, Auguste Bartholdi received design patent number 11,023 titled "Design for a Statue". It was for the Statue of Liberty.
PatentStorm News
Make the Most of Our Site
See this month's Top Inventors and Most Cited Patents.
Stay on top of the latest innovations by subscribing to an RSS feed.
Registered users: Manage your profile.
| Number | Title | Issue Date |
| 8182706 | Method for texturing silicon wafers for producing solar cells In a method for texturing silicon wafers for producing solar cells, the step of introducing a silicon wafer involves the use of a texturing solution which is at a temperature of at least 80 degrees Celsius and which comprises water admixed with 1 percent by weight t... | 05/22/2012 |
| 8129277 | Method of machining wafer A method of machining a wafer in which, at the time of grinding the back-side surface of the wafer, only a back-side surface region corresponding to a device formation region where semiconductor chips are formed is thinned by grinding, to form a recessed part on the... | 03/06/2012 |
| 8119018 | Magnetoresistive effect element manufacturing method and multi-chamber apparatus for manufacturing magnetoresistive effect element A magnetoresistive effect element manufacturing method includes a first step of preparing a magnetoresistive effect element including a magnetic film and a substrate, a second step of etching a predetermined region of the magnetic film by a reactive ion etching meth... | 02/21/2012 |
| 8119017 | Method using block copolymers for making a master mold with high bit-aspect-ratio for nanoimprinting patterned magnetic recording disks The invention is a method for making a master mold to be used for nanoimprinting patterned-media magnetic recording disks. The method uses conventional optical or e-beam lithography to form a pattern of generally radial stripes on a substrate, with the stripes being... | 02/21/2012 |
| 8091506 | High velocity method for depositing diamond films from a gaseous phase in SHF discharge plasma and a plasma reactor for carrying out said method The invention relates to carbon deposition by decomposing gaseous compounds with the aid of the SHF discharge plasma. Said invention ensures a high speed deposition of the high quality diamond films (having a loss-tangent angle δ equal to or less than 3×10−... | 01/10/2012 |
| 8088690 | CMP method The instant invention is a method of polishing a substrate including contacting a substrate having at least one metal layer including copper with a chemical-mechanical polishing composition. The CMP composition includes an abrasive, a surfactant, an oxidizer, an org... | 01/03/2012 |
| 8075733 | Plasma processing apparatus A plasma processing apparatus includes: a decompression chamber of which the inside is depressed; a gas supply unit that supplies process gas into said chamber; a microwave supply unit that supplies a microwave into the chamber to generate plasma; an object-placing ... | 12/13/2011 |
| 8067067 | Clean, dense yttrium oxide coating protecting semiconductor processing apparatus Disclosed herein is a method for applying plasma-resistant coatings for use in semiconductor processing apparatus. The coatings are applied over a substrate which typically comprises an aluminum alloy of the 2000 series or the 5000 through 7000 series. The coating t... | 11/29/2011 |
| 8062980 | Method of fabricating semiconductor device A method of fabricating a semiconductor device according to one embodiment includes: forming a core material on a workpiece; forming a coating film comprising an amorphous material so as to cover an upper surface and side faces of the core material; crystallizing th... | 11/22/2011 |
| 8058175 | Method for planarization of wafer and method for formation of isolation structure in top metal layer The invention discloses a planarization method for a wafer having a surface layer with a recess, comprises: forming an etching-resist layer on the surface layer to fill the entire recess; etching the etching-resist layer and the surface layer, till the surface layer... | 11/15/2011 |
| 8048228 | Masking apparatus and method of fabricating electronic component A masking apparatus includes a mask base body and a mask plate. The mask base body includes at least one spacer plate, and a cavity in which an electronic component can be housed. The mask plate is disposed on an upper surface and/or a lower surface of the mask base... | 11/01/2011 |
| 8038836 | Plasma processing apparatus A plasma processing apparatus includes a barrier wall member disposed between a plasma generation chamber and a processing chamber to separate the plasma generation chamber from the processing chamber. The barrier wall member assumes a fin structure achieved by disp... | 10/18/2011 |
| 8033246 | Arc suppression An arc suppression arrangement suppresses arcs in a gas discharge device that is operated with an alternating voltage from a power supply. The arc suppression arrangement includes an arc suppression device and an arc identification device that controls the arc suppr... | 10/11/2011 |
| 8028654 | Planar controlled zone microwave plasma system An apparatus and method for initiating a process gas plasma. A conductive plate having a plurality of conductive fingers is positioned in a microwave applicator. An arc forms between the conductive fingers to initiate the formation of a plasma. A transport mechanism... | 10/04/2011 |
| 8029621 | Raw material feeding device, film formation system and method for feeding gaseous raw material A raw material feeding device for feeding a gaseous raw material formed by sublimating a solid raw material to a film formation system includes a raw material container for holding the solid raw material therein, a first heating unit placed at a first side of the co... | 10/04/2011 |
| 8028655 | Plasma processing system with locally-efficient inductive plasma coupling An inductively coupled plasma source is provided with a peripheral ionization source for producing a high-density plasma in a vacuum chamber for semiconductor wafer coating or etching. The source includes a segmented configuration having high and low radiation segme... | 10/04/2011 |
| 8021487 | Wafer carrier with hub A wafer carrier for a rotating disc CVD reactor includes a unitary plate of a ceramic such as silicon carbide defining wafer-holding features such as pockets on its upstream surface and also includes a hub removably mounted to the plate in a central region of the pl... | 09/20/2011 |
| 8020513 | Cooled device for plasma depositing a barrier layer onto a container A device for plasma depositing a thin film of a barrier material on an internal wall of a container includes: an electromagnetic wave generator; a cavity connected to the generator and made of a conductive material; a chamber positioned in the cavity and made of a m... | 09/20/2011 |
| 8021485 | Positioning apparatus In the present positioning apparatus, a positioning apparatus, comprising: a box body including a process chamber exposed to a decompression environment in the interior of the box body and an opening allowing said process chamber to communicate with an outside; a mo... | 09/20/2011 |
| 8006641 | Installation for depositing, by means of a microwave plasma, an internal barrier coating in thermoplastic containers Installation for depositing, by means of a microwave plasma, a barrier coating on thermoplastic containers (5), this installation comprising treatment stations (1) each comprising a treatment enclosure (2) and a cover (3) and including a ... | 08/30/2011 |
| 7998307 | Electron beam enhanced surface wave plasma source A plasma processing system is described for generating plasma with a ballistic electron beam using a surface wave plasma (SWP) source, such as a radial line slot antenna (RLSA) during semiconductor device fabrication. The antenna comprises a resonator plate having a... | 08/16/2011 |
| 7993460 | Substrate support having dynamic temperature control A substrate support useful for a plasma processing apparatus includes a metallic heat transfer member and an overlying electrostatic chuck having a substrate support surface. The heat transfer member includes one or more passage through which a liquid is circulated ... | 08/09/2011 |
| 7989023 | Method of improving mixing of axial injection in thermal spray guns Method for performing a thermal spray process. Method includes heating and/or accelerating a gas to form an effluent gas stream, feeding a particulate-bearing carrier stream through an axial injection port into the effluent gas stream to form a mixed stream, in whic... | 08/02/2011 |
| 7988787 | Workpiece support system and method A workpiece support system for a vacuum coating machine includes a base table having a rotating spindle rod that extends in a vertical direction away from the base table and is capable of powered rotation. A stop post is connected to the table and extends in a verti... | 08/02/2011 |
| 7988816 | Plasma processing apparatus and method A plasma etching apparatus includes an upper electrode and a lower electrode, between which plasma of a process gas is generated to perform plasma etching on a wafer W. The apparatus further comprises a cooling ring disposed around the wafer, a correction ring dispo... | 08/02/2011 |
| 7981218 | Substrate supporting mechanism and substrate processing apparatus A substrate supporting mechanism includes a function for heating a substrate placed thereon in a process container of a substrate processing apparatus. The substrate supporting mechanism includes a worktable configured to place the substrate thereon and including a ... | 07/19/2011 |
| 7980197 | Method and apparatus for dispensing a viscous material on a substrate A dispenser for dispensing a volume of viscous material on a substrate includes a frame, a gantry system coupled to the frame, and a dispenser unit coupled to the gantry system. The dispenser unit includes a housing having a chamber and a piston disposed in the cham... | 07/19/2011 |
| 7975644 | Batter applicator with adjustable tilt control for submerger or coating mechanism A batter applicator with an adjustable coating mechanism is disclosed which includes a frame, a main batter tank, a structure comprising at least one of a submerger and an overflow structure that is adapted to be positioned proximate the main batter tank and actuata... | 07/12/2011 |
| 7975646 | Device for depositing a coating on an internal surface of a container Device for depositing a coating on an internal surface of a container, of the type in which the deposition is carried out by means of a low-pressure plasma created inside the container by excitation of a precursor gas by microwave-type electromagnetic waves. An inje... | 07/12/2011 |
| 7976672 | Plasma generation apparatus and work processing apparatus A plasma generation apparatus is provided which includes: a microwave generation portion which generates a microwave; a gas supply portion which supplies a gas to be turned into plasma; a plasma generation nozzle which includes a reception member receiving the micro... | 07/12/2011 |
| 7966966 | Vacuum high pressure filling equipment The present invention proposes a vacuum/high pressure filling apparatus which can improve the filling rate and shorten the impregnating time period in immersing a porous workpiece into a filling liquid. The vacuum/high pressure filling apparatus includes: an openabl... | 06/28/2011 |
| 7959734 | Substrate mounting structure and substrate processing apparatus A substrate mounting structure that can maintain the temperature uniformity of a substrate mounted on a mounting stage. The substrate mounting structure disposed in a pressure reduced space has a base portion, a pillar portion mounted in a standing manner on the bas... | 06/14/2011 |
| 7954449 | Wiring-free, plumbing-free, cooled, vacuum chuck A solar cell production system utilizes self-contained vacuum chucks that hold and cool solar cell wafers during transport on a conveyor between processing stations during a fabrication process. Each self-contained vacuum chuck includes its own local vacuum pump and... | 06/07/2011 |
| 7954446 | Hopper for cleaning coating machine A hopper for cleaning a coating machine in which a rotary atomizing head extends through an opening in the upper surface of a hopper housing, a thinner for cleaning the rotary atomizing coating machine and a residual coating material are sprayed on the inside, an ai... | 06/07/2011 |
| 7954448 | Film forming apparatus and method of film formation A film forming apparatus includes a film forming chamber for performing a film formation; an exhaust unit connected to the film forming chamber to discharge a gas out of the film forming chamber; a holder provided in the film forming chamber to hold a process-object... | 06/07/2011 |
| 7951261 | Plasma etching apparatus The present invention relates to a plasma etching apparatus. In the apparatus, potential difference is applied between a substrate support with a substrate seated thereon and a electrode surrounding an edge region of the substrate, and a distance between the substra... | 05/31/2011 |
| 7942971 | Method of manufacturing plasma display panels A method of manufacturing plasma display panels using a substrate holder for deposition on a substrate of the plasma display panel. The substrate holder is configured with plural frames, and the substrate of the plasma display panel is held by its periphery with at ... | 05/17/2011 |
| 7942112 | Method and apparatus for preventing the formation of a plasma-inhibiting substance A system and method for preventing formation of a plasma-inhibiting substance within a plasma chamber is provided. In one embodiment, an apparatus that includes a barrier component configured to be disposed within a plasma chamber. The barrier component includes a w... | 05/17/2011 |
| 7938081 | Radial line slot antenna having a conductive layer A radial line slot antenna (RLSA) is described for generating plasma during semiconductor device fabrication. The antenna comprises a resonator plate having a partially open, electrically conductive layer coupled to a surface of the resonator plate. For example, the... | 05/10/2011 |
| 7934468 | Plasma processing apparatus and plasma processing method Microwaves propagated through the waveguide 30, a plurality of slots 31 and the dielectric members 33 in this order are supplied into the processing chamber U where they are used to excite a gas to plasma to be used to process a substrate G. Alu... | 05/03/2011 |
