| Patent No. | Patent Title: |
| 6450117 | Directing a flow of gas in a substrate processing chamber |
| 6423178 | Apparatus for plasma process |
| 6309978 | Beat frequency modulation for plasma generation |
| 6260510 | PCVD apparatus and method of manufacturing an optical fiber, a pr... |
| 6237526 | Process apparatus and method for improving plasma distribution an... |
| 6231673 | Manufacturing method of semiconductor wafer, semiconductor manufa... |
| 6210485 | Chemical vapor deposition vaporizer |
| 6203621 | Vacuum chuck for holding thin sheet material |
| 6203715 | Method for the manufacture of a thin film actuated mirror array |
| 6199506 | Radio frequency supply circuit for in situ cleaning of plasma-enh... |
| 6196155 | Plasma processing apparatus and method of cleaning the apparatus |
| 6186090 | Apparatus for the simultaneous deposition by physical vapor depos... |
| 6182604 | Hollow cathode for plasma doping system |
| 6178920 | Plasma reactor with internal inductive antenna capable of generat... |
| 6176932 | Thin film deposition apparatus |
| 6176931 | Wafer clamp ring for use in an ionized physical vapor deposition ... |
| 6173674 | Plasma reactor with a deposition shield |
| 6174371 | Substrate treating method and apparatus |
| 6173673 | Method and apparatus for insulating a high power RF electrode thr... |
| 6171437 | Semiconductor manufacturing device |
| 6170431 | Plasma reactor with a deposition shield |
| 6165313 | Downstream plasma reactor system with an improved plasma tube sea... |
| 6165274 | Plasma processing apparatus and method |
| 6159299 | Wafer pedestal with a purge ring |
| 6158384 | Plasma reactor with multiple small internal inductive antennas |
| 6159300 | Apparatus for forming non-single-crystal semiconductor thin film,... |
| 6159301 | Substrate holding apparatus for processing semiconductor |
| 6155202 | Plasma processing apparatus, matching box, and feeder |
| 6152072 | Chemical vapor deposition coating of fibers using microwave appli... |
| 6149760 | Plasma processing apparatus |
| 6149730 | Apparatus for forming films of a semiconductor device, a method o... |
| 6149729 | Film forming apparatus and method |
| 6148763 | Deposited film forming apparatus |
| 6146492 | Plasma process apparatus with in situ monitoring, monitoring meth... |
| 6146462 | Structures and components thereof having a desired surface c... |
| 6143078 | Gas distribution system for a CVD processing chamber |
| 6139681 | Plasma assisted process vessel cleaner |
| 6138606 | Ion implanters for implanting shallow regions with ion dopant com... |
| 6135053 | Apparatus for forming a deposited film by plasma chemical vapor ... |
| 6132513 | Process chemistry resistant manometer |
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